Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Dmitry Zhernokletov"'
Publikováno v:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Variations in etch rates during plasma etching can occur due to differences in the conditioning of the inside surfaces of a plasma reactor. Passivation of the surfaces of the reactor wall by plasma generated species can change the composition of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::803129ea993f0954308b865eecd58690
https://doi.org/10.1109/asmc49169.2020.9185362
https://doi.org/10.1109/asmc49169.2020.9185362
Autor:
Christopher Hinkle, Barry Brennan, Stephen McDonnell, Marko Milojevic, Arif Sonnet, Dmitry Zhernokletov, Rohit Galatage, Eric Vogel, Robert Wallace
Publikováno v:
ECS Meeting Abstracts. :1228-1228
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::82064f90667dedd1b9df59f7f2db76e0
https://doi.org/10.1149/ma2011-01/18/1228
https://doi.org/10.1149/ma2011-01/18/1228