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Autor:
Vladimir A. Terekhov, Evgeniy I. Terukov, Yurii K. Undalov, Konstantin A. Barkov, Nikolay A. Kurilo, Sergey A. Ivkov, Dmitry N. Nesterov, Pavel V. Seredin, Dmitry L. Goloshchapov, Dmitriy A. Minakov, Elena V. Popova, Anatoly N. Lukin, Irina N. Trapeznikova
Publikováno v:
Symmetry, Vol 15, Iss 9, p 1800 (2023)
The influence of Ar + SiH4 + O2 plasma formulation on the phase composition and optical properties of amorphous SiOx films with silicon nanoclusters obtained using PECVD with DC discharge modulation was studied. Using a unique technique of ultrasoft
Externí odkaz:
https://doaj.org/article/b179c60351484136aaf79db454413a79
