Zobrazeno 1 - 10
of 124
pro vyhledávání: '"Dmitry Levko"'
Autor:
Dmitry Levko, Laxminarayan L. Raja
Publikováno v:
High Voltage (2016)
An instability in the stable operation of microdischarges sustained at microwave frequencies, is investigated by a self-consistent one-dimensional particle-in-cell Monte Carlo collisions model. The instability is caused by the field electron emission
Externí odkaz:
https://doaj.org/article/144604faf2ad460baffb7694efb92000
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XI.
Autor:
Dmitry Levko, Laxminarayan L. Raja
Publikováno v:
Journal of Applied Physics. 133:053301
The main aim of the present paper is to clarify the influence of the SF6 fraction in the SF6/N2 mixture on the breakdown voltage. For this, the two-dimensional axisymmetric fluid model coupled with the comprehensive mechanism of plasma chemical react
Autor:
Dmitry Levko
Publikováno v:
The Journal of Technological and Space Plasmas. 1:54-62
Self-oscillations of non-neutral plasma diode operating in the anode-glow mode are analysed using the self-consistent one-dimensional Particle-in-Cell Monte Carlo collisions model. In order to obtain these states, the current exceeding the space-char
Publikováno v:
Journal of Vacuum Science & Technology B. 41:012205
Using a self-consistent plasma model coupled with Maxwell's equations, the limitations of independent control of ion fluxes and their energy distribution functions extracted from the high-density inductively coupled chlorine plasma are studied. Two e
Autor:
Dmitry Levko, Laxminarayan L. Raja
Publikováno v:
Journal of Applied Physics. 132:243301
The influence of electron field emission on the sub-normal mode of a magnetized direct current high-pressure helium discharge is analyzed using the two-dimensional axisymmetric fluid model. It is observed that in spite of accounting for a more intens
Autor:
Dmitry Levko, Laxminarayan L. Raja
Publikováno v:
Journal of Vacuum Science & Technology B. 40:052205
A chemical reaction mechanism of chlorine plasma under low-pressure conditions that is widely used in the literature is validated against the experimental data of Y. Wang and J. K. Olthoff [J. Appl. Phys. 85, 6358 (1999)] for an inductively coupled p
Autor:
Dmitry Levko, Laxminarayan L. Raja
Publikováno v:
Journal of Vacuum Science & Technology B. 40:042202
A self-consistent two-dimensional axisymmetric fluid plasma model coupled with Maxwell's equations is used to analyze the plasma kinetics of inductively coupled Ar/NF3 low-pressure plasma. We have developed a plasma chemical reaction mechanism for Ar
Publikováno v:
Journal of Physics D: Applied Physics. 55:345204
We report on transient generation of highly ionized (ionization degree ∼10%) argon microplasma using a self-consistent fluid plasma model coupled with the compressible Navier–Stokes equations. The plasma is generated within a micrometer size cath
Autor:
Dmitry Levko, Laxminarayan L. Raja
Publikováno v:
Journal of Vacuum Science & Technology B. 40:032203
We use a fluid plasma model coupled with Maxwell's equations to analyze the influence of various parameters on the silicon etching rate by inductively coupled low-pressure plasma (ICP) generated in a CF4/O2/Ar mixture. These parameters include differ