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Autor:
Dmitriy W Zhuk, Andrei Sazonov, B. G. Budaguan, Mikhail N Bosyakov, Dmitriy I Grunsky, Alexander A. Popov
Publikováno v:
Journal of Non-Crystalline Solids. :39-42
Device-quality a-Si:H films were obtained in a 55 kHz glow discharge (GD) at a deposition rate of 1.5 nm/s. In the present work, this GD was investigated to clarify the mechanism of high-rate deposition. The investigations were performed in an indust