Rapid characterization and modeling of pattern-dependent variation in chemical-mechanical polishing.

Autor: Stine, Brian E., Ouma, Dennis O., Divecha, Rajesh R., Boning, Duane S., Chung, James E., Hetherington, Dale L., Harwood, C. Randy, Nakagawa, O. Samuel, Soo-Young Oh

Publikováno v: IEEE Transactions on Semiconductor Manufacturing; Feb98, Vol. 11 Issue 1, p129, 12p, 4 Black and White Photographs, 9 Diagrams, 2 Charts, 20 Graphs