Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Dip Mahato"'
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Oxide Bridge (OX BG) with wafer center signature was found in the back-end-of-line (BEOL) section of IC fabrication. The defect resembled lifted photoresist (PR) pattern and was uncovered to be related with the weak points at the scribe lines surroun
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c53fc1509aa3e1a1f4ea64606e6c200
https://doi.org/10.1109/asmc.2019.8791766
https://doi.org/10.1109/asmc.2019.8791766
