Zobrazeno 1 - 10
of 58
pro vyhledávání: '"Dinkar S, Patil"'
Autor:
Bablu Basumatary, Santanu Podder, Samir Thakur, Jyotisman Bora, Bikash Sharma, Sankar Moni Borah, Nirab Ch. Adhikary, Dinkar S. Patil, Arup R. Pal
Publikováno v:
ACS Omega, Vol 7, Iss 9, Pp 7662-7674 (2022)
Externí odkaz:
https://doaj.org/article/d5ce18b014b044deb61f48aa47258858
Autor:
Mr. Bablu Basumatary, Dr. Deepshikha Gogoi, Dr Santanu Podder, Mr. Jyotisman Bora, Mr. Khomdram Bijoykumar Singh, Mr. Shakya Deep Bora, Arup R. Pal, Prof. Dinkar S. Patil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0844217238b65d8ba00102372f5f603e
https://doi.org/10.2139/ssrn.4366435
https://doi.org/10.2139/ssrn.4366435
Autor:
A. Bute, Devendra Bhale, Vandan Nagar, Dinkar S. Patil, Namita Maiti, N. Chand, A. V. S. S. Narayana Rao, R. Kar, Ravindranath Shashidhar
Publikováno v:
IEEE Transactions on Plasma Science. 49:2774-2784
Atmospheric pressure cold plasma generated using a radio frequency hollow cathode (RFHC) device recently showed its potent virucidal characteristics. For this purpose, the atmospheric pressure cold plasma of Ar was generated with a specially designed
Publikováno v:
IEEE Transactions on Plasma Science. 49:615-623
Langmuir probe (LP) diagnostics is performed on an inductively coupled plasma (ICP) generated using a flat spiral antenna. The current–voltage ( $I - V$ ) characteristics are measured using a radio frequency (RF) compensated LP to mitigate the effe
Autor:
Ashok Jadhavar, Ashvini Punde, Ashish Waghmare, Sandesh Jadkar, Pratibha Shinde, Priti Vairale, Dinkar S. Patil, Nilesh Patil, Subhash Pandharkar, Vidya Doiphode, Mohit Prasad, Yogesh Hase, Ajinkya Bhorde, Shruthi Nair
Publikováno v:
Recent Innovations in Chemical Engineering (Formerly Recent Patents on Chemical Engineering). 14:58-70
Objective: Herein, we report the effect of variation of hydrogen flow rate on the properties of Si:H films synthesized using PE-CVD method. Raman spectroscopy analysis show an increase in crystalline volume fraction and crystallite size implying that
Effect of Antenna-Substrate Distance on Quality of a-Si:H During ICP CVD Using a Flat Spiral Antenna
Publikováno v:
IEEE Transactions on Plasma Science. 49:624-631
Amorphous silicon (a-Si:H) thin films are deposited on silicon substrates by inductively coupled plasma chemical vapor deposition (ICP-CVD) using a flat spiral antenna and SiH4 as the precursor gas. The films are deposited at operating pressure of 20
Autor:
Ashish Sharma, A. Bute, S. K. Ghosh, Dinkar S. Patil, A. V. S. S. Narayan Rao, R. Kar, Vandan Nagar, N. Chand, Namita Maiti, Ravindranath Shashidhar
Publikováno v:
Transactions of the Indian National Academy of Engineering
Atmospheric pressure cold plasma is a promising technology in fighting pathogenic micro-organisms. In times of Covid-19 pandemic, we have decided to modify two types of cold plasma devices to study their effectiveness in the killing of pathogenic mic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2a0e276b4c5257cc25d7eaa327db940
https://doi.org/10.21203/rs.3.rs-31789/v1
https://doi.org/10.21203/rs.3.rs-31789/v1
Publikováno v:
Handbook of Environmental Materials Management ISBN: 9783319585383
Handbook of Environmental Materials Management
Handbook of Environmental Materials Management
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03a704d7916c7f9a5fd9980a30319bbe
https://doi.org/10.1007/978-3-319-58538-3_224-1
https://doi.org/10.1007/978-3-319-58538-3_224-1
Autor:
Romesh Chandra, P. Jagasia, N. Chand, R. Kar, A. Bute, P.S. Dhami, Dinkar S. Patil, Sudeshna Sinha
Publikováno v:
Environmental Technology & Innovation. 12:219-229
Plasma is probably the most underused tool applied for nuclear waste management. To study the feasibility of putting this technology in practice, a non-thermal microwave based atmospheric pressure plasma jet (APPJ) had been developed. The device was
Autor:
Sachin R. Suryawanshi, Dinkar S. Patil, Arup R. Pal, Rajiv O. Dusane, Bikash Sharma, Ramakrishna Shilpa, Mahendra A. More, R. Kar, S. Sinha
Publikováno v:
Materials Today Communications. 16:178-185
Atmospheric pressure glow discharge plasma assisted chemical vapor deposition process is used for the growth of carbon nanotubes (CNTs) on Inconel without using any external catalyst. Four different sets of samples are prepared by varying the growth