Zobrazeno 1 - 2
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pro vyhledávání: '"Ding, Xuemiao"'
Surface evolution mechanism for atomic-scale smoothing of Si via atmospheric pressure plasma etching
Publikováno v:
In Journal of Manufacturing Processes 26 December 2024 132:353-362
Autor:
Wu, Bing, Liang, Shaoxiang, Zhang, Junqi, Ding, Xuemiao, Chiu, Tom, Huang, Pei, Wang, Yinhui, Deng, Hui
Publikováno v:
In Precision Engineering October 2024 90:71-80