Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Dimitrios Tsamados"'
Publikováno v:
Optical Microlithography XXXIII.
The consideration of wafer topography effects in lithographic modeling of implant layers is mandatory for sub 32nm processes. The approximate assumption that both oxide- and resist thickness are independent of pattern design can lead to large model p
Autor:
Adrian M. Ionescu, Juergen Brugger, Nenad V. Cvetkovic, Dimitrios Tsamados, Katrin Sidler, Veronica Savu
Publikováno v:
Microelectronic Engineering. 98:508-511
Graphical abstractDisplay Omitted Highlights? Stencils are used to fabricate pentacene thin film transistors on polyimide. ? Transistors are stretched to maximum 2.6% strain up to 28,000 times. ? Results reveal that first stretching cycle affects the
Autor:
Veronica Savu, Dimitrios Tsamados, Adrian M. Ionescu, Katrin Sidler, Jyotshna Bhandari, Juergen Brugger, Nenad V. Cvetkovic
Publikováno v:
Solid-State Electronics. 54:1003-1009
In this work double-gate pentacene TFT architecture is proposed and experimentally investigated. The devices are fabricated on a polyimide substrate based on a process that combines three levels of stencil lithography with standard photolithography.
Autor:
Juergen Brugger, Nenad V. Cvetkovic, Dimitrios Tsamados, Adrian M. Ionescu, Katrin Sidler, Veronica Savu
Publikováno v:
Sensors and Actuators A: Physical. 162:155-159
This paper presents new results on miniaturized organic thin film transistors (TFT) fabricated on a spin coated polyimide (PI) film. Patterning steps, that are vital for the integrity and electrical performances of the organic TFT, were performed usi
Autor:
D. Acquaviva, Adrian M. Ionescu, Thomas Skotnicki, Dimitrios Tsamados, Philippe Coronel, Didier Bouvet
Publikováno v:
Microelectronic Engineering. 86:1074-1077
The design, fabrication and characterization of Micro-electro-mechanical metal-air-insulator-semiconductor (MEM-MAIS) diode switch are originally reported. An abrupt switching from off-state to Fowler-Nordheim tunneling current in on-state is induced
Autor:
Christoph Eggimann, K. Akarvardar, Adrian M. Ionescu, Dimitrios Tsamados, Yogesh Singh Chauhan, H.-S. Philip Wong
Publikováno v:
Solid-State Electronics. 52:1374-1381
This paper proposes, the investigation of the Suspended Gate Field-Effect Transistor (SG-FET) small-slope switch based on a hybrid numerical simulation approach combining ANSYSTM Multiphysics and ISE-DESSISTM in a self-consistent system. The proposed
Autor:
Christoph Eggimann, Dimitrios Tsamados, G.C. Wan, Hon-Sum Philip Wong, Adrian M. Ionescu, Y. Singh Chauhan, Roger T. Howe, K. Akarvardar
Publikováno v:
IEEE Transactions on Electron Devices. 55:48-59
An analytical model for the suspended-gate field-effect transistor (SGFET), dedicated to the dc analysis of SGFET logic circuits, is developed. The model is based on the depletion approximation and expresses the pull-in voltage, the pull-out voltage,
Publikováno v:
Microelectronic Engineering. 97:166-168
We present the successful fabrication of horizontally grown and dense carbon nanotube (CNT) membranes in situ. A TiN/Al2O3/TiN stack is first patterned to be employed as a support for the CNT growth. Iron is then evaporated with a 45 degrees tilt ang
Publikováno v:
2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
Modern CMOS and memory devices feature fins, which are high aspect ratio elements. While narrow and tall fins enhance electrical characteristics, they are mechanically weak structures. Unexpected failure mechanisms, such as fin bending and even crack
Autor:
Vladimir Cherman, Sebastian T. Bartsch, Hiroshi Mizuta, Silvia Armini, Faezeh Arab Hassani, Cecilia Dupre, Mohammad Adel Ghiass, Eric Ollier, Dimitrios Tsamados, Yoshishige Tsuchiya
Publikováno v:
2012 12th IEEE International Conference on Nanotechnology (IEEE-NANO).
A double-gate suspended silicon nanowire transistor (DGSSiNWT) is proposed for conduction-based chemical/biological sensing applications. The doping profile is uniform across the device without any junction. The suspended silicon nanowire (SiNW) prov