Zobrazeno 1 - 10
of 81
pro vyhledávání: '"Dimitrios Kazazis"'
Autor:
Paola Pellacani, Konstantins Jefimovs, Margherita Angelini, Franco Marabelli, Valentina Tolardo, Dimitrios Kazazis, Francesco Floris
Publikováno v:
Optics, Vol 5, Iss 1, Pp 165-175 (2024)
The selection of an affordable method to fabricate plasmonic metasurfaces needs to guarantee complex control over both tunability and reproducibility of their spectral and morphological properties, making plasmonic metasurfaces suitable for integrati
Externí odkaz:
https://doaj.org/article/cfcb52d2db6b4d00b8b0a06fb164c69d
Autor:
Margherita Angelini, Konstantins Jefimovs, Paola Pellacani, Dimitrios Kazazis, Franco Marabelli, Francesco Floris
Publikováno v:
Optics, Vol 5, Iss 1, Pp 195-206 (2024)
Plasmonic arrays are grating-like structures able to couple an incoming electromagnetic field into either localized or propagating surface plasmonic modes. A triangular array of elliptical holes in a gold layer were realized resorting to displacement
Externí odkaz:
https://doaj.org/article/65ce21cfe50e43b38331f7c8721c537a
Autor:
Procopios Constantinou, Taylor J. Z. Stock, Li-Ting Tseng, Dimitrios Kazazis, Matthias Muntwiler, Carlos A. F. Vaz, Yasin Ekinci, Gabriel Aeppli, Neil J. Curson, Steven R. Schofield
Publikováno v:
Nature Communications, Vol 15, Iss 1, Pp 1-13 (2024)
Abstract Atomically precise hydrogen desorption lithography using scanning tunnelling microscopy (STM) has enabled the development of single-atom, quantum-electronic devices on a laboratory scale. Scaling up this technology to mass-produce these devi
Externí odkaz:
https://doaj.org/article/863f13ac0b89477eb31bb15c0190843d
Autor:
Aysegul Develioglu, Timothée Paul Allenet, Michaela Vockenhuber, Lidia van Lent-Protasova, Iacopo Mochi, Yasin Ekinci, Dimitrios Kazazis
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Scott M. Lewis, Hayden R. Alty, Michaela Vockenhuber, Guy A. Derose, Dimitrios Kazazis, Grigore A. Timco, James A. Mann, Paul Winpenny, Axel Scherer, Yasin Ekinci, Richard E. Winpenny
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Li-Ting Tseng, Prajith Karadan, Dimitrios Kazazis, Procopios C. Constantinou, Taylor J. Z. Stock, Neil J. Curson, Steven R. Schofield, Matthias Muntwiler, Gabriel Aeppli, Yasin Ekinci
Publikováno v:
Science Advances, 9 (16)
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its high
Autor:
Arik Beck, Dimitrios Kazazis, Yasin Ekinci, Xiansheng Li, Elisabeth Agnes Müller Gubler, Armin Kleibert, Marc-Georg Willinger, Luca Artiglia, Jeroen A. van Bokhoven
Publikováno v:
ACS Nano, 17 (2)
Hydrogen spillover from metal nanoparticles to oxides is an essential process in hydrogenation catalysis and other applications such as hydrogen storage. It is important to understand how far this process is reaching over the surface of the oxide. He
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::81aca811ebb2de2ec0132ca9602f8341
https://hdl.handle.net/20.500.11850/588741
https://hdl.handle.net/20.500.11850/588741
Autor:
Thomas Mortelmans, Dimitrios Kazazis, Celestino Padeste, Philipp Berger, Xiaodan Li, Yasin Ekinci
Publikováno v:
ACS Applied Nano Materials. 5:517-526
Autor:
Timothée P. Allenet, Michaela Vockenhuber, Lidia van Lent-Protasova, Yasin Ekinci, Dimitrios Kazazis
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Autor:
Antonio Fernandez Mato, Lewis, Scott M., Alty, Hayden R., Michaela Vockenhuber, Derose, Guy A., Dimitrios Kazazis, Winpenny, Paul L., Richard Grindell, Timco, Grigore A., Axel Scherer, Yasin Ekinci, Winpenny, Richard E. P.
Publikováno v:
Antonio Fernandez Mato
Journal of Micro/Nanopatterning, Materials, and Metrology
Journal of Micro/Nanopatterning, Materials, and Metrology
A new class of negative-tone resist materials has been developed for electron beam and extreme ultraviolet lithography. The resist is based on heterometallic rings. From initial electron beam lithography studies, the resist performance demonstrated a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a6d5d7cbda09dc6cbd4b2e9882e1790b
https://resolver.caltech.edu/CaltechAUTHORS:20220721-8168000
https://resolver.caltech.edu/CaltechAUTHORS:20220721-8168000