Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Dima Lubomirsky"'
Publikováno v:
IEEE Transactions on Plasma Science. 42:1636-1639
An argon plasma generated between the cone-shaped electrode powered by commercial electronic ballast and grounded plane electrode has been investigated. Since the electronic ballast has positive and negative cycle in a period, two different discharge
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2311c1a7b34c4df62a7c0e13ad49d72
https://doi.org/10.1109/tps.2014.2321172
https://doi.org/10.1109/tps.2014.2321172
Publikováno v:
2016 IEEE International Conference on Plasma Science (ICOPS).
Applied Materials' funnel-shaped electrode configuration for remote plasma process is being used for oxide removals in semiconductor manufacturing process. Remote plasma removal process actively uses chemically activated species from plasma rather th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd7d8458bf76e294f455ee0cef676815
https://doi.org/10.1109/plasma.2016.7534008
https://doi.org/10.1109/plasma.2016.7534008
Autor:
Masaya Hotta, Dima Lubomirsky, Keiji Nakamura, Yuichi Hasegawa, Kobayashi Satoru, Soonam Park, Hideo Sugai
Publikováno v:
Japanese Journal of Applied Physics. 56:116002
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5859b5abe15e952a0cc2b59feef9eb1b
https://doi.org/10.7567/jjap.56.116002
https://doi.org/10.7567/jjap.56.116002
Publikováno v:
Japanese Journal of Applied Physics. 56:046203
A digitally controlled solid-state microwave generator allowing variable frequency operation and precise phase control is adopted for plasma generation. In this study, a resonant cylindrical cavity is used as a microwave applicator in place of conven
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6bb309e0027d6d7fdd987ed61964f262
https://doi.org/10.7567/jjap.56.046203
https://doi.org/10.7567/jjap.56.046203
Publikováno v:
Japanese Journal of Applied Physics. 55:056201
Cone-shaped hollow cathode electrode configuration for a damage free remote plasma removal process has been optimized for given pressures based on Paschen characteristic curves, voltage–current characteristics and time-resolved discharge observatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f9631337bfecc65b3260eb2c557575f
https://doi.org/10.7567/jjap.55.056201
https://doi.org/10.7567/jjap.55.056201
Autor:
Ian A. Pancham, Arulkumar Shanmugasundram, F. Mei, Dima Lubomirsky, Kapila Wijekoon, H. Fang, Y. Wang, Timothy W. Weidman, Michael D. Armacost, Z. Zhu, Mehul Naik
Publikováno v:
Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005..
Electroless CoWP was integrated with k/spl sim/3.0 carbon doped oxide using SiCN as the post CMP dielectric barrier. Process parameters that impacted leakage performance and line resistance increase were identified and resolved. Leakage performance e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3100811908186125b69b6c0e17e46088
https://doi.org/10.1109/iitc.2005.1499911
https://doi.org/10.1109/iitc.2005.1499911
Autor:
Timothy Weidman, Zhize Zhu, Hongbin Fang, Fang Mei, Yaxin Wang, Arulkumar Shanmugasundram, Brikram Kapoor, Kapila Wijekoon, Dima Lubomirsky, Ian Pancham
Publikováno v:
ECS Meeting Abstracts. :361-361
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b622c6e11189633052f5c1eb0e5dcbb
https://doi.org/10.1149/ma2005-01/7/361
https://doi.org/10.1149/ma2005-01/7/361
Publikováno v:
ECS Meeting Abstracts. :689-689
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d91cd6ab40e4741b9fb5fb3ef386241c
https://doi.org/10.1149/ma2005-02/17/689
https://doi.org/10.1149/ma2005-02/17/689
Publikováno v:
Japanese Journal of Applied Physics; Apr2017, Vol. 56 Issue 4, p1-1, 1p
Publikováno v:
Japanese Journal of Applied Physics; May2016, Vol. 55 Issue 5, p1-1, 1p