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pro vyhledávání: '"Dieter Van Den Heuval"'
Autor:
Junichi Kitano, Eric Hendrickx, Shinichi Hatakeyama, Josh Hooge, Kathleen Nafus, Philippe Leray, Ben Rathsack, Phillipe Foubert, Roel Gronheid, Dieter Van Den Heuval, Steven Scheer, Hontake Kouichi
Publikováno v:
Optical Microlithography XXI.
As the industry extends immersion lithogr aphy to the 32 nm node, the limits of image and resist contrast will be challenged. Image contrast is limited by the inherent numerical aperture of a water based immersion lithography system. Elements of resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::675c2d2e569e6b7ee2c75cf9cb8964c6
https://doi.org/10.1117/12.772728
https://doi.org/10.1117/12.772728
