Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Diederik de Bruin"'
Autor:
Natalia V. Davydova, Lieve van Look, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Eelco van Setten, Bram Slachter, Laura L. Huddleston, Claire van Lare, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Tatiana Kovalevich, Diederik de Bruin, Stephen Hsu, Rene Carpaij
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4dab72bbb0e94903157e9929591fe380
https://doi.org/10.1117/12.2658511
https://doi.org/10.1117/12.2658511
Autor:
Kaustuve Bhattacharyya, Rudy Peters, Greet Storms, Diederik de Bruin, Jara G. Santaclara, Rob van Ballegoij, Eelco van Setten, Teun van Gogh
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d6a1a308c004494b08b1ebb39702213f
https://doi.org/10.1117/12.2644966
https://doi.org/10.1117/12.2644966
Autor:
Natalia V. Davydova, Vincent Wiaux, Joost Bekaert, Frank J. Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen D. Hsu, Rene Carpaij
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::26d488bca49883dacb2615972fb0652d
https://doi.org/10.1117/12.2653388
https://doi.org/10.1117/12.2653388
Autor:
Gerald Dicker, Peter Jenkins, Diederik de Bruin, Pieter Woltgens, Brennan Peterson, Boudewijn G. Sluijk
Publikováno v:
SPIE Proceedings.
The most exciting and continuous debate in our industry is how long Moore’s law will continue, and tightly connected to this is the discussion on when EUV Lithography will be introduced in microchip mass manufacturing. In this review paper, we anal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46b9fa1da1baf7e2488d1caa5afad34e
https://doi.org/10.1117/12.2195622
https://doi.org/10.1117/12.2195622
Autor:
Greet Storms, Sjoerd Lok, Rob van Ballegoij, Jan van Schoot, Rudy Peeters, Diederik de Bruin, Kars Troost, Teun van Gogh
Publikováno v:
Optical and EUV Nanolithography XXXV
SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::03558a12fb1ca8b36da13436b61c7667
