Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Didier Marsan"'
Autor:
Rutger Voets, LM Luc Augustin, Huub Ambrosius, Patty Stabile, Sylwester Latkowski, Jeroen Bolk, D. D'Agostino, Kevin A. Williams, E Elton Bitincka, Didier Marsan, P. DasMahapatra
Publikováno v:
43rd European Conference on Optical Communication, ECOC 2017, 1-3
STARTPAGE=1;ENDPAGE=3;TITLE=43rd European Conference on Optical Communication, ECOC 2017
ISSUE=43;STARTPAGE=1;ENDPAGE=3;TITLE=43rd European Conference on Optical Communications (ECOC 2017)
ECOC
STARTPAGE=1;ENDPAGE=3;TITLE=43rd European Conference on Optical Communication, ECOC 2017
ISSUE=43;STARTPAGE=1;ENDPAGE=3;TITLE=43rd European Conference on Optical Communications (ECOC 2017)
ECOC
ArF deep UV (193 nm) lithography was successfully applied to fabricate Arrayed Waveguide Gratings in generic Indium Phosphide technology. The sub-dB transmission losses demonstrate the advantages of scaling down the minimum feature size to 100 nm.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3f7e21e5d116a0ef6acb67b598c5eef2
https://research.tue.nl/nl/publications/e7e5bff8-170a-4c29-8cf5-a0239a42bf09
https://research.tue.nl/nl/publications/e7e5bff8-170a-4c29-8cf5-a0239a42bf09
Autor:
Didier Marsan
Publikováno v:
III-Vs Review. 12(2):48-51
For the past three years InPact (Pombliere, France) has been examining the use of TOF-SIMS for analysis of the surface (first) monolayer of InP wafers. Here, the company outlines the technique and the benefits to surface quality that can be gained fr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d00432bc2b0ae9aa4fd0033abe8d6eb6
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