Characterizing wearout, breakdown, and trap generation in thin silicon oxide.

Autor: Dumin, D. J., Maddux, J. R., Subramoniam, R., Scott, R. S., Vanchinathan, S., Dumin, N. A., Dickerson, K. J., Mopuri, S., Gladstone, S. M., Hughes, T. W.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 4, p1780-1787, 8p