Zobrazeno 1 - 10
of 51
pro vyhledávání: '"Diane Samélor"'
Autor:
Babacar Diallo, Konstantina C. Topka, Maxime Puyo, Charlotte Lebesgue, Cécile Genevois, Raphael Laloo, Diane Samelor, Hélène Lecoq, Mathieu Allix, Hugues Vergnes, François Senocq, Pierre Florian, Vincent Sarou-Kanian, Thierry Sauvage, Marie-Joelle Menu, Brigitte Caussat, Viviane Turq, Constantin Vahlas, Nadia Pellerin
Publikováno v:
Journal of Materials Research and Technology, Vol 13, Iss , Pp 534-547 (2021)
The chemical or mechanical performance of amorphous SiO2 films depend on intrinsic physicochemical properties, which are intimately linked to atomic and molecular arrangements in the Si–O–Si network. In this context, the present work focuses on a
Externí odkaz:
https://doaj.org/article/80f03ccf7d3b4464847e117b7ea030d7
Autor:
Sebastian M.J. Beer, Diane Samelor, Alsayed Abdel Aal, Johannes Etzkorn, Detlef Rogalla, Asiya E. Turgambaeva, Jerome Esvan, Aleksander Kostka, Constantin Vahlas, Anjana Devi
Publikováno v:
Journal of Materials Research and Technology, Vol 13, Iss , Pp 1599-1614 (2021)
The direct liquid injection chemical vapor deposition (DLI-CVD) of uniform and dense zirconium oxide (ZrO2) thin films applicable as corrosion protection coatings (CPCs) is reported. We present the entire development chain from the rational choice an
Externí odkaz:
https://doaj.org/article/f47eed5ea43e4cff9136047721f1ab85
Autor:
Sana Aslam, Abderrahime Sekkat, Hugues Vergnes, Jérôme Esvan, Alessandro Pugliara, Diane Samélor, Nicolas Eshraghi, Constantin Vahlas, Jérémie Auvergniot, Brigitte Caussat
Publikováno v:
Chemical Engineering Journal Advances, Vol 16, Iss , Pp 100554- (2023)
A new route to deposit alumina nanometric thin films on powders from the single source Aluminum Tri-Isopropoxide (ATI) precursor is developed using the Fluidized Bed Chemical Vapor Deposition (FBCVD) process. For this study, an easy-to-fluidize silic
Externí odkaz:
https://doaj.org/article/d3ef304a933d4afe99ef04215af5e83d
Autor:
Konstantina Christina Topka, Paris Papavasileiou, Babacar Diallo, Tryfon Tsiros, Laura Decosterd, Brigitte Caussat, Marie-Joëlle Menu, Diane Samélor, Constantin Vahlas, Hugues Vergnes, François Senocq, Nadia Pellerin
Publikováno v:
Chemical Engineering Journal
Chemical Engineering Journal, Elsevier, 2022, 431, pp.133350. ⟨10.1016/j.cej.2021.133350⟩
Chemical Engineering Journal, Elsevier, In press, pp.133350. ⟨10.1016/j.cej.2021.133350⟩
Chemical Engineering Journal, 2021, 431, pp.133350. ⟨10.1016/j.cej.2021.133350⟩
Chemical Engineering Journal, Elsevier, 2022, 431, pp.133350. ⟨10.1016/j.cej.2021.133350⟩
Chemical Engineering Journal, Elsevier, In press, pp.133350. ⟨10.1016/j.cej.2021.133350⟩
Chemical Engineering Journal, 2021, 431, pp.133350. ⟨10.1016/j.cej.2021.133350⟩
International audience; An apparent kinetic model is developed for a novel chemical vapor deposition (CVD) process of silicon oxynitride (SiO x N y) films from tris(dimethylsilyl)amine (TDMSA) and O 2 , operating at moderate temperature (600-650 •
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::60e3a3fcf72dd08e5297b8c594a254cd
https://hal.archives-ouvertes.fr/hal-03448364
https://hal.archives-ouvertes.fr/hal-03448364
Publikováno v:
Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2021, 425, pp.127711. ⟨10.1016/j.surfcoat.2021.127711⟩
Surface and Coatings Technology, Elsevier, 2021, 425, pp.127711. ⟨10.1016/j.surfcoat.2021.127711⟩
International audience; Actual requirements of the pharmaceutics industry for reliable, safe, long term storage of biopharmaceuticals imply the use of chemically inert glass vials. This can be achieved by applying a barrier coating on their internal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4b824a91660b18c7eee6dac50065112f
https://oatao.univ-toulouse.fr/28427/
https://oatao.univ-toulouse.fr/28427/
Autor:
Aleksander Kostka, Asiya E. Turgambaeva, Alsayed Abdel Aal, Diane Samélor, Jérôme Esvan, Sebastian M. J. Beer, Detlef Rogalla, Anjana Devi, Johannes Etzkorn, Constantin Vahlas
Publikováno v:
Journal of Materials Research and Technology
Journal of Materials Research and Technology, Elsevier, 2021, 13, pp.1599-1614. ⟨10.1016/j.jmrt.2021.05.068⟩
Journal of Materials Research and Technology, Vol 13, Iss, Pp 1599-1614 (2021)
Journal of Materials Research and Technology, Elsevier, 2021, 13, pp.1599-1614. ⟨10.1016/j.jmrt.2021.05.068⟩
Journal of Materials Research and Technology, Vol 13, Iss, Pp 1599-1614 (2021)
The direct liquid injection chemical vapor deposition (DLI-CVD) of uniform and dense zirconium oxide (ZrO2) thin films applicable as corrosion protection coatings (CPCs) is reported. We present the entire development chain from the rational choice an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0963d88d86e6c9700de906e013ea6ebe
https://oatao.univ-toulouse.fr/27960/
https://oatao.univ-toulouse.fr/27960/
Autor:
Sergey V. Trubin, Asiya E. Turgambaeva, Vladislav V. Krisyuk, Jérôme Esvan, Sergey V. Sysoev, Diane Samélor, Constantin Vahlas, Vassilios Constandoudis, Jérémy Cure, Adeline Miquelot, P. A. Stabnikov
Publikováno v:
CrystEngComm
CrystEngComm, Royal Society of Chemistry, 2021, 23 (20), pp.3681-3692. ⟨10.1039/D1CE00081K⟩
CrystEngComm, 2021, 23 (20), pp.3681-3692. ⟨10.1039/D1CE00081K⟩
CrystEngComm, Royal Society of Chemistry, 2021, 23 (20), pp.3681-3692. ⟨10.1039/d1ce00081k⟩
CrystEngComm, Royal Society of Chemistry, 2021, 23 (20), pp.3681-3692. ⟨10.1039/D1CE00081K⟩
CrystEngComm, 2021, 23 (20), pp.3681-3692. ⟨10.1039/D1CE00081K⟩
CrystEngComm, Royal Society of Chemistry, 2021, 23 (20), pp.3681-3692. ⟨10.1039/d1ce00081k⟩
International audience; The photocatalytic properties of titanium dioxide TiO 2 thin films, a seminal semiconductor material in solar radiation involving key enabling technologies depend on their structural characteristics which, in turn are monitore
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::809dd2be654f7230bd6f1b7cf51f250d
https://hal.archives-ouvertes.fr/hal-03358869/file/Samelor_27962.pdf
https://hal.archives-ouvertes.fr/hal-03358869/file/Samelor_27962.pdf
Autor:
Maxime Puyo, Vincent Sarou-Kanian, Pierre Florian, Diane Samélor, Mathieu Allix, Constantin Vahlas, Hélène Lecoq, Brigitte Caussat, Marie-Joëlle Menu, Raphaël Laloo, Viviane Turq, François Senocq, Charlotte Lebesgue, T. Sauvage, Nadia Pellerin, Cécile Genevois, Babacar Diallo, Hugues Vergnes, Konstantina Christina Topka
Publikováno v:
Journal of Materials Research and Technology
Journal of Materials Research and Technology, Elsevier, 2021, ⟨10.1016/j.jmrt.2021.04.067⟩
Journal of Materials Research and Technology, Vol 13, Iss, Pp 534-547 (2021)
Journal of Materials Research and Technology, Elsevier, 2021, ⟨10.1016/j.jmrt.2021.04.067⟩
Journal of Materials Research and Technology, Vol 13, Iss, Pp 534-547 (2021)
The chemical or mechanical performance of amorphous SiO2 films depend on intrinsic physicochemical properties, which are intimately linked to atomic and molecular arrangements in the Si–O–Si network. In this context, the present work focuses on a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7062f00e9d66b35460f6873c97e95baf
https://hal.archives-ouvertes.fr/hal-03231610/document
https://hal.archives-ouvertes.fr/hal-03231610/document
Autor:
Laura Decosterd, Constantin Vahlas, Konstantina Christina Topka, Babacar Diallo, Hugues Vergnes, François Senocq, Brigitte Caussat, Marie-Joëlle Menu, Diane Samélor
Publikováno v:
Physical Chemistry Chemical Physics
Physical Chemistry Chemical Physics, Royal Society of Chemistry, 2021, 23 (17), pp.10560-10572. ⟨10.1039/d1cp01129d⟩
Physical Chemistry Chemical Physics, Royal Society of Chemistry, 2021, 23 (17), pp.10560-10572. ⟨10.1039/d1cp01129d⟩
International audience; Tris(dimethylsilyl)amine (TDMSA) is used in the presence of O2 and NH3 for the atmospheric pressure chemical vapor deposition (CVD) of conformal, corrosion barrier silicon oxynitride (SiOxNy) films at moderate temperature. Pla
Autor:
Cécile Genevois, Babacar Diallo, Diane Samélor, Konstantina Christina Topka, Daniel Sadowski, Raphaël Laloo, Viviane Turq, Hugues Vergnes, Constantin Vahlas, T. Sauvage, Nadia Pellerin, Brigitte Caussat, François Senocq
Publikováno v:
Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2020, 407, ⟨10.1016/j.surfcoat.2020.126762⟩
Surface and Coatings Technology, Elsevier, 2020, 407, ⟨10.1016/j.surfcoat.2020.126762⟩
International audience; Silica and silica-based materials with tunable functionalities are frequently encountered in low-k material applications, porous membranes, and microelectonic devices. In the present study, an innovative O2 /O3 assisted CVD pr