Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Diane Carol Freeman"'
Publikováno v:
Journal of Display Technology. 5:484-494
We report on zinc oxide (ZnO)-based devices produced by a fast, open-air atomic layer deposition (ALD) process relying upon the spatial isolation of reactive gases. At deposition rates of greater than 100 Aring per minute, ZnO-based thin-film transis
Autor:
Wendy G. Ahearn, Shelby F. Nelson, Manju Rajeswaran, Deepak Shukla, Dianne M. Meyer, Diane Carol Freeman, Jeffrey Todd Carey
Publikováno v:
Chemistry of Materials. 20:7486-7491
In organic thin film transistors (OTFT), the morphology and microstructure of an organic thin film has a strong impact on the charge carrier mobility and device characteristics. To have well-defined and predictable thin film morphology, it is necessa
Autor:
Diane Carol Freeman, David H. Levy, Shelby F. Nelson, Lee W. Tutt, Jie Sun, Sung Kyu Park, Dalong Zhao, Peter J. Cowdery-Corvan, Thomas N. Jackson, Devin A. Mourey
Publikováno v:
IEEE Electron Device Letters. 29:721-723
We have fabricated ring oscillators (ROs) using ZnO thin films deposited by using a spatial atomic layer deposition process at atmospheric pressure and low temperature (200degC). Bottom-gate thin-film transistors with aluminum source and drain contac
Publikováno v:
SID Symposium Digest of Technical Papers. 38:284-286
An ambient process was developed for producing both the dielectric and semiconductor layers of a zinc oxide-based thin-film transistor. The dielectric films exhibited good electrical properties, leading to devices with gate leakage less than 25 nA/cm
Autor:
Sung Kyu Park, Thomas N. Jackson, Shelby F. Nelson, Sheng-Chu Wu, Lisong Zhou, Jie Sun, Bo Bai, Yongtaek Hong, Diane Carol Freeman
Publikováno v:
IEEE Electron Device Letters. 26:640-642
Pentacene organic thin-film transistors (TFTs)-driven active matrix organic light-emitting diode (OLED) displays has been investigated. This letter addresses several process issues unique to this type of display which are important in achieving brigh
Autor:
Mitchell Stewart Burberry, Diane Carol Freeman, David H. Levy, Peter J. Cowdery-Corvan, Lee W. Tutt, Lyn M. Irving, Shelby F. Nelson
Publikováno v:
2007 65th Annual Device Research Conference.
We have fabricated zinc oxide thin-film transistors using a novel ambient deposition process, with maximum temperature of 200degC. The TFTs deposited this way show sufficiently good properties to make them potentially applicable to OLED display backp
Autor:
Lee W. Tutt, Devin A. Mourey, Diane Carol Freeman, Sung Kyu Park, Thomas N. Jackson, Shelby F. Nelson, Peter J. Cowdery-Corvan, Jie Sun, David H. Levy, Dalong Zhao
Publikováno v:
2007 65th Annual Device Research Conference.
We report here five-stage ring-oscillator-integrated circuits fabricated using ZnO TFTs with signal propagation delays as low as 100 ns (>1 MHz oscillation frequency) for a 45 V supply voltage. These circuits also operate at a supply voltage as low a
Autor:
Devin A. Mourey, Lee W. Tutt, Peter J. Cowdery-Corvan, Sung Kyu Park, David H. Levy, Dalong Zhao, Shelby F. Nelson, Jie Sun, Diane Carol Freeman, Thomas N. Jackson
Publikováno v:
2007 IEEE International Electron Devices Meeting.
We have fabricated simple circuits, including ring oscillators, using ZnO thin films deposited by low temperature (200degC) atmospheric pressure chemical vapor deposition. Bottom gate TFTs with aluminum source and drain contacts typically had field e
Autor:
Alfred Wanga, Jie Sun, Thomas N. Jackson, Diane Carol Freeman, Sheng Chu Wu, Shelby F. Nelson, Sung Kyu Park, Yongtaek Hong, Lisong Zhou
Publikováno v:
SPIE Proceedings.
We have fabricated pentacene organic thin-film transistor (OTFT) driven active matrix organic light-emitting diode (OLED) displays on both glass and flexible polyethylene terephthalete (PET) substrates. These displays have 48 × 48 bottom-emission OL
Publikováno v:
Applied Physics Letters. 92:192101
We report stable, high performance zinc oxide thin film transistors grown by an atmospheric pressure atomic layer deposition system. With all deposition and processing steps kept at or below 200°C, the alumina gate dielectric shows low leakage (belo