Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Diana Shaphirov"'
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::383190a390b0d7c52546266ec8595ea6
https://doi.org/10.1117/12.2657850
https://doi.org/10.1117/12.2657850
Autor:
Xiaolei Liu, Yoav Grauer, Raviv Yohanan, Mark Ghinovker, Diana Shaphirov, Yasuhisa Iwata, Koichi Imura, Kosuke Ito
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f32212e678f46c56f9d756102e3f492
https://doi.org/10.1117/12.2614129
https://doi.org/10.1117/12.2614129
Autor:
Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, DongSub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, DongYoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87c2c7efc3be8f8bbcc7e2039896893f
https://doi.org/10.1117/12.2608053
https://doi.org/10.1117/12.2608053
Autor:
Katya Gordon, Hedvi Spielberg, Diana Shaphirov, Xiaolei Liu, Eltsafon Ashwal, Eitan Hajaj, Philippe Leray, Mark Ghinovker, Chen Dror, Raviv Yohanan, Zephyr Liu, Dieter Van den Heuvel, Roel Gronheid
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
As design nodes of advanced semiconductor chips shrink, reduction in on-product overlay (OPO) budget becomes more critical to achieving higher yield. Imaging-based overlay (IBO) targets usually consist of periodic patterns where their pitches are res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a71df7b888ddfb6580f81ecc9e7b9d1
https://doi.org/10.1117/12.2585876
https://doi.org/10.1117/12.2585876
Autor:
Mark Ghinovker, Katya Gordon, Eltsafon Ashwal, Eitan Hajaj, Isaac Salib, Raviv Yohanan, Xiaolei Liu, Chen Dror, Zephyr Liu, Diana Shaphirov
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
In recent years, simulation-based analysis has become an integral phase in metrology targets design process, performances optimization wise to support on product overlay (OPO) reduction, accuracy and robustness to process variation. Moreover, a simul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3138996e91dd72b952a0be9774c46313
https://doi.org/10.1117/12.2584525
https://doi.org/10.1117/12.2584525
Autor:
Chanha Park, Xiaolei Liu, Dongyoung Lee, Chen Dror, Eltsafon Ashwal, Dongsoo Kim, Sanghuck Jeon, Zephyr Liu, Katya Gordon, Honggoo Lee, Eitan Hajaj, Mark Ghinovker, Diana Shaphirov, Sang-Ho Lee, Dongsub Choi, Dohwa Lee, Raviv Yohanan
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
Reduction in on product overlay (OPO) is a key component for high-end, high yield integrated circuit manufacturing. Due to the continually shrinking dimensions of the IC device elements it has become near-impossible to measure overlay on the device i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c6be2fb79531aea498fc923d2afaeb1
https://doi.org/10.1117/12.2584524
https://doi.org/10.1117/12.2584524