Zobrazeno 1 - 10
of 27
pro vyhledávání: '"Diana Nyyssonen"'
Autor:
Diana Nyyssonen
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography X.
One of the factors that influences the nature of secondary electron imaging and the subsequent metrology of submicron features in a SEM is the system's ability to collect low energy secondary electrons (LES). In a SEM, a bias voltage is applied to th
Publikováno v:
SPIE Proceedings.
Bright field optical microscopy has well-known nonlinearity problems due to varying film thickness. Phase images eliminate many of these problems. This paper will describe the advantages of phase imaging, based on calculated results. Experimental cor
Autor:
Diana Nyyssonen
Publikováno v:
SPIE Proceedings.
In a previous paper, a 2D atomic force probe metrology system was described. The system consists of a 2D atomic force probe used in attractive mode (non-contact) with a laser inter- ferometer system for measuring sample displacement with nanometer se
Publikováno v:
SPIE Proceedings.
This paper describes a 2-D atomic force microprobe (AFM) system designed specifically for accurate submicron critical dimension (CD) metrology. The system includes 2-D AFM sensing, 3-D position interferometry with 1.25 nm sensitivity, and a special t
Autor:
Diana Nyyssonen
Publikováno v:
SPIE Proceedings.
Optical linewidth measurements on patterned wafers are complicated by the wide variety of materials and correspondingly wide variation in optical parameters, complex refractive index and thickness, used in the manufacture of integrated circuits. It h
Autor:
Robert Monteverde, Diana Nyyssonen
Publikováno v:
SPIE Proceedings.
A new Line Width Standard has been developed. It is a physical specimen consisting of calibrated lines and spaces patterned in metal and dielectric layers on a silicon substrate. The standard is for calibration of reflected light measurement systems.
Autor:
Russell D. Young, Diana Nyyssonen, Arie W Hartman, William J. Keery, John M. Jerke, Richard E. Swing
Publikováno v:
SPIE Proceedings.
In the current linewidth-measurement program at the National Bureau of Standards, the primary measurement of micrometer-wide lines on black-chromium artifacts is made with an interferometer located in a scanning electron microscope (SEM). The data ou
Autor:
Diana Nyyssonen
Publikováno v:
Optical Engineering. 13
An improved method of measuring spatial coherence is described and some sources of measurement errors are discussed. Partial coherence in the image plane of an optical system is discussed and results of coherence measurements are given that demonstra
Autor:
Diana Nyyssonen, Chris P. Kirk
Publikováno v:
SPIE Proceedings.
A monochromatic, waveguide model is presented which can predict the optical microscope images of thick-layer objects including multilayer structures with sloping, curved, and undercut edges, granular structures such as polysilicon, and asymmetric obj
Autor:
Diana Nyyssonen
Publikováno v:
Optical Engineering. 21
In contrast to earlier work with nearly opaque photomasks, optical linewidth measurements on wafers encompass materials with a much wider variation in optical parameters and material profiles. Accurate optical edge detection requires corrections for