Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Dhananjay Singh Rathore"'
Autor:
I. Friedler, E. Frishman, Dhananjay Singh Rathore, N. Teomim, J. Chess, B. Watson, Roman Kris, S. Duvdevani Bar, V. Mirovoy, J. Geva, Grigory Klebanov, D. Rogers
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
CD measurements of advanced 3D-NAND Staircase process require development of new approaches in CD metrology [1]. The current CD SEM Contact Analysis used for 3D-NAND assumes that process control could be provided through a set of geometric parameters
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e18efdb16f3e6df6dcef88865e3edc01
https://doi.org/10.1117/12.2559399
https://doi.org/10.1117/12.2559399
Autor:
Elad Sommer, Ran Alkoken, Tal Bar-On, Liraz Gershtein, Svetlana Pastur, Roman Kris, Hiroshi Miroku, Efrat Noifeld, I Horikawa, Ishai Schwarzband, Olga Novak, Grigory Klebanov, Sharon Duvdevani-bar, Dhananjay Singh Rathore, Bobin Mathew, Shimon Levy
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
The growing demand for advanced DRAM technologies requires development of novel process control methodologies reflecting design rule shrinkage. The new challenges for CD SEM metrology of dense feature arrays of DRAM layers are widely considered in th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4077f68a2acbd3ff30056c8880190825
https://doi.org/10.1117/12.2515233
https://doi.org/10.1117/12.2515233