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pro vyhledávání: '"Devlin Donnelly"'
Autor:
Thu Van Thi Nguyen, Sandeep Kohli, Tania Henry, Devlin Donnelly, Vincent Ip, Meng H. Lee, Frank Cerio, Katrina Rook, Kenji Yamamoto, Adrian J. Devahasayam, Narasimhan Srinivasan, Paul Turner
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2019.
As Extreme Ultra Violet lithography (EUVL) is becoming adopted into manufacturing, there is an ongoing need to identify and improve the EUV mask multilayer properties that impact reflectivity. Key properties include the roughness and inter-diffusion