Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Devika, Choudhury"'
Autor:
Jake Soares, Anil U. Mane, Devika Choudhury, Steven Letourneau, Steven M. Hues, Jeffrey W. Elam, Elton Graugnard
Publikováno v:
Chemistry of Materials. 35:927-936
Autor:
Anusheela Das, Leighton O. Jones, Yanna Chen, Devika Choudhury, Denis T. Keane, Jeffrey W. Elam, George C. Schatz, Michael J. Bedzyk
Publikováno v:
The Journal of Physical Chemistry Letters. 13:5304-5309
Autor:
Wesley Jen, John D. Hues, Jake Soares, Steven Letourneau, Matthew Lawson, Devika Choudhury, Anil U. Mane, Yu Lu, Yaqiao Wu, Steven M. Hues, Lan Li, Jeffrey W. Elam, Elton Graugnard
Publikováno v:
2023 IEEE Workshop on Microelectronics and Electron Devices (WMED).
Autor:
Veronica Anne-Line Kathrine Killi, Jeffrey W. Elam, Henrik Hovde Sønsteby, Helmer Fjellvåg, Devika Choudhury, Ola Nilsen, Thomas Aarflot Storaas
Publikováno v:
Dalton Transactions. 49:13233-13242
Functional coatings based on alkali metals have become increasingly attractive in the current shift towards sustainable technologies. While lithium-based compounds have a natural impact on batteries, other alkali metal compounds are important as repl
Autor:
Jeffrey W. Elam, Haesun Park, Peter Zapol, Devika Choudhury, Anusheela Das, Michael J. Bedzyk, Tien Lin Lee, Yanna Chen
Publikováno v:
Journal of the American Chemical Society. 143(43)
During redox reactions, oxide-supported catalytic systems undergo structural and chemical changes. Improving subsequent catalytic properties requires an understanding of the atomic-scale structure with chemical state specificity under reaction condit
Autor:
Anil U. Mane, Devika Choudhury, Jeffrey W. Elam, David J. Mandia, Maximilian Gebhard, Angel Yanguas-Gil, Alfred P. Sattelberger, Steven Letourneau
Publikováno v:
Chemistry of Materials. 31:7821-7832
We present the full investigation of the atomic layer deposition (ALD) of a mixed rhenium–aluminum oxide, namely ReAl2O3CH3, a material with tunable resistance, comprising the building unit of cond...
Autor:
Henrik H, Sønsteby, Veronica A-L K, Killi, Thomas A, Storaas, Devika, Choudhury, Jeffrey W, Elam, Helmer, Fjellvåg, Ola, Nilsen
Publikováno v:
Dalton transactions (Cambridge, England : 2003). 49(38)
Functional coatings based on alkali metals have become increasingly attractive in the current shift towards sustainable technologies. While lithium-based compounds have a natural impact on batteries, other alkali metal compounds are important as repl
Autor:
Seth B. Darling, Devika Choudhury, Jeffrey W. Elam, Alex B. F. Martinson, Paul F. Nealey, David J. Mandia, Ruben Z. Waldman
Publikováno v:
JOM. 71:212-223
We report the sequential infiltration synthesis (SIS) of aluminum oxide (Al2O3) into polyethersulfone (PES) ultrafiltration (UF) membranes to form hybrid nanocomposites. SIS relies on chemical interactions between precursor vapors and polymer functio
Autor:
Devika Choudhury, A. Mane, Angel Yanguas-Gil, Jeffrey W. Elam, Matthias J. Young, Steven Letourneau
Publikováno v:
ECS Meeting Abstracts. :843-843
Here we report two new advances in atomic layer etching (ALEt) that extend our range of capabilities in nanoscale device fabrication. Semiconductor device manufacturing is limited by our ability to precisely deposit and remove thin film layers at the
Publikováno v:
ECS Meeting Abstracts. :1690-1690
Thin layers of two dimensional (2D) materials mainly transition metal dichalcogenides (TMDs) and more specifically ultra-thin layered-MoS2 semiconductor possess exceptional properties such as electrical, optical, magnetic, mechanical and chemical pro