Zobrazeno 1 - 10
of 300
pro vyhledávání: '"Derose, Guy"'
Publikováno v:
In Journal of Vascular Surgery June 2021 73(6):1966-1972
Long-term outcomes comparing endovascular and open abdominal aortic aneurysm repair in octogenarians
Publikováno v:
In Journal of Vascular Surgery April 2020 71(4):1162-1168
Autor:
Hossain, Sajjid, Leblanc, Dominic, Farber, Alik, Power, Adam H., DeRose, Guy, Duncan, Audra, Dubois, Luc
Publikováno v:
In European Journal of Vascular & Endovascular Surgery March 2019 57(3):382-391
Autor:
DeRose, Guy Arthur
X-ray Absorption Fine Structure (XAFS) spectroscopy was examined, for the first time, as a technique for the determination of elastic strain in thin evaporated films and thin foils. The electron yield and fluorescence yield detection techniques were
Externí odkaz:
http://rave.ohiolink.edu/etdc/view?acc_num=case1060005230
We demonstrate single-mode lasing at telecommunication wavelengths from a circular nanocavity employing a radial Bragg reflector. Ultra-small modal volume and Sub milliwatt pump threshold level are observed for lasers with InGaAsP quantum well active
Externí odkaz:
http://arxiv.org/abs/physics/0505094
A novel class of circular resonators, based on a radial defect surrounded by Bragg reflectors, is studied in detail. Simple rules for the design and analysis of such structures are derived using a transfer matrix formalism. Unlike conventional ring r
Externí odkaz:
http://arxiv.org/abs/physics/0501143
Publikováno v:
In Journal of Vascular Surgery November 2018 68(5):1517-1523
Publikováno v:
Opt. Lett. 29, 2641(2004)
Lasing at telecommunication wavelengths from annular resonators employing radial Bragg reflectors is demonstrated at room temperature under pulsed optical pumping. Sub milliwatt pump threshold levels are observed for resonators with 0.5-1.5 wavelengt
Externí odkaz:
http://arxiv.org/abs/physics/0409068
Autor:
Antonio Fernandez Mato, Lewis, Scott M., Alty, Hayden R., Michaela Vockenhuber, Derose, Guy A., Dimitrios Kazazis, Winpenny, Paul L., Richard Grindell, Timco, Grigore A., Axel Scherer, Yasin Ekinci, Winpenny, Richard E. P.
Publikováno v:
Antonio Fernandez Mato
Journal of Micro/Nanopatterning, Materials, and Metrology
Journal of Micro/Nanopatterning, Materials, and Metrology
A new class of negative-tone resist materials has been developed for electron beam and extreme ultraviolet lithography. The resist is based on heterometallic rings. From initial electron beam lithography studies, the resist performance demonstrated a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a6d5d7cbda09dc6cbd4b2e9882e1790b
https://resolver.caltech.edu/CaltechAUTHORS:20220721-8168000
https://resolver.caltech.edu/CaltechAUTHORS:20220721-8168000
Akademický článek
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