Zobrazeno 1 - 10
of 39
pro vyhledávání: '"Derek Nowak"'
Publikováno v:
Soft Matter. 18:4513-4526
The concept of biomolecule release from co-assembled PS-b-PEO films (left) is depicted. The main findings (right) display an analysis of protein stability, a release comparison depending on cargo size, and tuning release by adjusting film thickness.
Autor:
Laura Otter, Katja Eder, Matt Kilburn, Limei Yang, Padraic O'Reilly, Derek Nowak, Julie Cairney, Dorrit Jacob
Biominerals, such as nacreous bivalve shells, are important archives of environmental information. The processes explaining how the organisms code this information into the structure and composition of their shells are yet unknown. Most marine calcif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::384ee513fe205e367306d7dbd8dc63ec
https://doi.org/10.21203/rs.3.rs-1810421/v1
https://doi.org/10.21203/rs.3.rs-1810421/v1
Autor:
Michael Förster, Dorrit E. Jacob, Padraic O’Reilly, Laura M. Otter, Sung Park, Derek Nowak, Elena Belousova, Simon M. Clark, Stephen F. Foley
Publikováno v:
Geostandards and Geoanalytical Research. 45:5-27
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Derek Nowak, Paulina Rincon Delgadillo, Albrecht Thomas R, Akiyoshi Yamazaki, Xuanxuan Chen, Takaya Maehashi, Paul F. Nealey, Ken Miyagi, R. Joseph Kline, Takahiro Dazai, Daniel F. Sunday
Publikováno v:
Chemistry of Materials. 32:2399-2407
The challenges of patterning next-generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost-effective size ...
Autor:
Michael Förster, Chunfei Chen, Isra Ezad, Padraic O’Reilly, Derek Nowak, Sung Park, Dorrit Jacob
Publikováno v:
Goldschmidt2022 abstracts.
Publikováno v:
Microscopy and Microanalysis. 28:930-931
Autor:
Derek Nowak, Dorrit E. Jacob, Padraic O’Reilly, Laura M. Otter, M. Forster, Simon M. Clark, Elena Belousova, Sung Park, Stephen F. Foley
Publikováno v:
Goldschmidt2021 abstracts.
Autor:
Daniel F, Sunday, Xuanxuan, Chen, Thomas R, Albrecht, Derek, Nowak, Paulina Rincon, Delgadillo, Takahiro, Dazai, Ken, Miyagi, Takaya, Maehashi, Akiyoshi, Yamazaki, Paul F, Nealey, R Joseph, Kline
Publikováno v:
Chem Mater
The challenges of patterning next generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost effective size scaling. The directed self-assembly (DSA) of block co
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.