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pro vyhledávání: '"Deoksin Kil"'
Autor:
Eunae Jung, Neung Kyung Yu, Donghak Jang, Bonggeun Shong, Hyunsik Noh, Jeongwoo Park, Deoksin Kil, Jiwon Moon
Publikováno v:
Coatings
Volume 10
Issue 8
Coatings, Vol 10, Iss 712, p 712 (2020)
Volume 10
Issue 8
Coatings, Vol 10, Iss 712, p 712 (2020)
Various processes based on atomic layer deposition (ALD) have been reported for growing Ti-based thin films such as TiN and TiO2. To improve the uniformity and conformity of thin films grown via ALD, fundamental understanding of the precursor&ndash
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a77bd51d76b9b712727f5f8464cb12fc
