Synthesis and polymerization of t-BOC protected maleimide monomers: N-(t-butyloxycarbonyloxy)maleimide and N-[p-(t-butyloxycarbonyloxy)phenyl]-maleimide

Autor: Deok-Il Koo, C. Grant Willson, Kwang-Duk Ahn

Publikováno v: Polymer. 36:2621-2628

Two t-butyloxycarbonyl (t-BOC) protected maleimide monomers, N -(t-butyloxycarbonyloxy)maleimide (t-BOCOMI) and N -[ p -(t-butyloxycarbonyloxy)phenylmaleimide (t-BOCOPMI), have been synthesized and polymerized. The t-BOC group was used to protect the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e0c8cae087d7b3d595231ebf01b9b2b2
https://doi.org/10.1016/0032-3861(95)91210-x

t-BOC maleimide copolymers for thermally stable deep UV resists by chemical amplification

Autor: Seong-Ju Kim, Deok-Il Koo, Kwang-Duk Ahn

Publikováno v: Journal of Photopolymer Science and Technology. 4:433-443

Four kinds of new t-BOC protected maleimide copolymers P(t-BOCMI/St), P(t-BOCMI/SiSt), P(t-BOCMI/t-BOCSt) and P(t-BOCOPMI/SiSt) were investigated as thermally stable, deep UV resists in high sensitivity. The resist polymers are composed of N-(t-butyl

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::026e7e5fbd7b95cfb9252a95dc81cd03
https://doi.org/10.2494/photopolymer.4.433

Synthesis and Polymerizations of N-(tert-Butoxy)maleimide and Application of Its Polymers as a Chemical Amplification Resist

Autor: Kwang-Duk Ahn, Deok-Il Koo

Publikováno v: ACS Symposium Series ISBN: 9780841227217
Polymers for Microelectronics: Resists and Dielectrics

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::95b3c780db8cf634798e066ae9812520
https://doi.org/10.1021/bk-1994-0537.ch009

Polymers for Microelectronics

Autor: LARRY F. THOMPSON, C. GRANT WILLSON, SEIICHI TAGAWA, E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, E. Chin, J. M. Kometani, Ying Jiang, David R. Bassett, N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, M. Hanabata, H. Ito, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Makoto Murata, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C. D. Snyder, R. D. Allen, C.-P. Lei, T. Long, S. K. Obendorf, F. Rodriguez, Kwang-Duk Ahn, Deok-Il Koo, Yoshiaki Inaki, Nobuo Matsumura, Kiichi Takemoto, G. M. Wallraff, L. L. Simpson, R. R. Kunz, Masamitsu Shirai, Masahiro Tsunooka, K. Watanabe, E. Yano, T. Namiki, Y. Yoneda, J. M. Calvert, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, V. Rao, C. W. Frank, R. F. W. Pease, James R. Sheats, Ralph Dammel, Michael T. Pottiger, John C. Coburn, M. F. Welker, H. R. Allcock, G. L. Grune, R. T. Chern, V. T. Stannett, Shinji Ando, Tohru Matsuura, Shigekuni Sasaki, K. Ushida, A. Kira, S. Tagawa, Y. Yoshida, H. Sh