Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Deodatta Vinayak Shenai-Khatkhate"'
Publikováno v:
Journal of Crystal Growth. 310:2395-2398
From the vapor pressure equation of a metalorganic precursor, its partial pressure is calculated. The accuracy of that vapor pressure equation is therefore important when calculating the deposition efficiency of a precursor. Knowing the exact value o
Autor:
Robert A. Ware, Ronald L. DiCarlo, Egbert Woelk, Alan G. Keiter, Deodatta Vinayak Shenai-Khatkhate, Charles J. Marsman, Robert F. Polcari
Publikováno v:
Journal of Crystal Growth. 287:679-683
Trimethylindium (TMI) is the preferred precursor for the deposition of indium containing layers by organo-metallic vapor phase epitaxy (OMVPE) because of its higher vapor pressure and its ability to transport readily into vapor phase. However, mainta
Autor:
Michael Brendan Power, Bruno Lamare, Deodatta Vinayak Shenai-Khatkhate, Grégoire Beaudoin, Artashes Amamchyan, Ronald L. DiCarlo, Egbert Woelk, Isabelle Sagnes
Publikováno v:
Journal of Crystal Growth. 287:684-687
Germanium and gallium arsenide have long been used in semiconductor structures and electronic devices. While organometallic vapor phase epitaxy (OMVPE) of gallium arsenide on germanium substrate is quite common in the solar cell industry for satellit
Publikováno v:
Journal of Crystal Growth. 272:816-821
As metalorganic vapor-phase epitaxy (MOVPE) is becoming well-established production technology, there are equally growing concerns associated with its bearing on personnel and community safety, environmental impact and maximum quantities of hazardous
Autor:
Deodatta Vinayak Shenai-Khatkhate, David J. Cole-Hamilton, Peter N. Culshaw, William Bell, Janet E. Hails, A. E. D. Mcqueen, John C. Walton
Publikováno v:
ChemInform. 23
Homolytic reactions of diorganotellurium and diorganoditellurium compounds in solution; an EPR study
Autor:
A.Ewan D. McQueen, Peter N. Culshaw, Deodatta Vinayak Shenai-Khatkhate, John C. Walton, William Bell, Janet E. Hails, David J. Cole-Hamilton
Publikováno v:
Journal of Organometallic Chemistry. 430:43-52
The thermal and photochemical decompositions of dialkyltelluriums and dialkylditelluriums in t-butylbenzene solvent have been studied by, EPR spectroscopy. On photolysis, di-t-butyl, diallyl, allyl methyl, and dibenzyl tellurium showed EPR spectra of
Autor:
David J. Cole-Hamilton, Deodatta Vinayak Shenai-Khatkhate, A.Ewan D. McQueen, J. Brian Mullin, John C. Walton, Peter N. Culshaw
Publikováno v:
Journal of Crystal Growth. 107:325-330
Unsymmetrical dialkyltellurides of type RTeR′ suitable for use as precursors in the metalorganic vapour phase epitaxy (MOVPE) of cadmium mercury telluride (CMT) can be prepared by an alkyl exchange process. For certain organotellurium compounds, re
Autor:
Deodatta Vinayak Shenai-Khatkhate, J.B. Mullin, A. E. D. Mcqueen, Marjory B. Parker, David J. Cole-Hamilton
Publikováno v:
Philosophical Transactions of the Royal Society of London. Series A, Mathematical and Physical Sciences. 330:173-182
Adduct purification of metal alkyls for use in metal-organic vapour-phase epitaxy is described and shown to give high purity alkyls of Al, Ga, In, Cd, Zn and Te. In most cases involatile Lewis bases are used to form dissociable adducts, but for tellu
Autor:
David J. Cole-Hamilton, J. Brian Mullin, Paul B. Webb, Graham W. Blackmore, Deodatta Vinayak Shenai-Khatkhate
Publikováno v:
Journal of Crystal Growth. 93:744-749
The preparation of a wide range of dialkyltellurium compounds of potential use as the precursors for the epitaxial growth of materials in the CdHgTe system is described. In general these are synthesised by a previously reported route. Methods f
Autor:
David J. Cole-Hamilton, Deodatta Vinayak Shenai-Khatkhate, D.C. Cupertino, E.D. Orrell, J.B. Mullin
Publikováno v:
Journal of Crystal Growth. 77:27-31
The preparation of adducts of Me2Cd and Me2Zn with a range of nitrogen donor ligands has been investigated. Those with two nitrogen atoms, which cannot for geometrical reasons bind to the same metal atom, are shown to give involatile polymeric adduct