Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Dennis De Graaf"'
Autor:
Tomasz Próchnicki, Matilde B. Vasconcelos, Kim S. Robinson, Matthew S. J. Mangan, Dennis De Graaf, Kateryna Shkarina, Marta Lovotti, Lena Standke, Romina Kaiser, Rainer Stahl, Fraser G. Duthie, Maximilian Rothe, Kateryna Antonova, Lea-Marie Jenster, Zhi Heng Lau, Sarah Rösing, Nora Mirza, Clarissa Gottschild, Dagmar Wachten, Claudia Günther, Thomas A. Kufer, Florian I. Schmidt, Franklin L. Zhong, Eicke Latz
Publikováno v:
Nature immunology 24(4), 595-603 (2023). doi:10.1038/s41590-023-01451-y
Upon detecting pathogens or cell stress, several NOD-like receptors (NLRs) form inflammasome complexes with the adapter ASC and caspase-1, inducing gasdermin D (GSDMD)-dependent cell death and maturation and release of IL-1β and IL-18. The triggers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::951cef744dde927be85ce561d1cb4398
Autor:
Andrea Lodovico Mancuso, Hilary Harrold, Ronald Harm Gunther Kramer, Daniel Smith, David Ockwell, Eric Casimiri, Paul Colsters, Piet Hennus, Paul Janssen, James N. Wiley, Dennis De Graaf, Derk Brouns, David van de Weg, Henk Kuntzel, Par Broman, Raymond Wilhelmus Louis Lafarre, Aage Bendiksen, Matthias Kruizinga
Publikováno v:
SPIE Proceedings.
ASML introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. We will present results of how we have taken the idea from concept to a demonstrated solution enabli
Autor:
Beatrijs Louise Marie-Joseph Katrien Verbrugge, Henk Kuntzel, Ronald Harm Gunther Kramer, Pieter Jan van Zwol, Derk Brouns, David Ockwell, Par Broman, Eric Casimiri, Dennis De Graaf, David van de Weg, Carmen Zoldesi, Aage Bendiksen, Paul Janssen, Paul Colsters, Peter A. Delmastro, Daniel Smith, Noelie Wojewoda, Matthias Kruizinga, Mark van de Kerkhof, James N. Wiley, Maria Peter, Frits Van Der Meulen
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII
Towards the end of 2014, ASML committed to provide a EUV pellicle solution to the industry. Last year, during SPIE Microlithography 2015, we introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future
Publikováno v:
Applied Surface Science. 257:48-55
Adhesion measurements were performed by AFM (Atomic Force Microscopy). It was shown that many parameters need to be controlled in order to provide reproducible and quantitative results. Adhesion forces were shown to depend on combination of materials