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Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21:814
CrxNy and CrxOyNz thin films and multilayer CrxNy–CrxOyNz thin films have been investigated as a binary masking material for 157 nm lithography. The chemical compositions of commercial photolithography masks were determined to be a bilayer structur