Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Denise Pinon"'
Autor:
Behnam Kheyraddini Mousavi, Adeeko Benga, Arash Kheyraddini Mousavi, Edidson Lima, Stephen Moya, Joseph D. Butner, Khawar Abbas, Denise Pinon, Zayd C. Leseman, Mirza Elahi
Publikováno v:
Vacuum. 109:216-222
Rekindled interest has developed in pulsed vacuum systems due to their use for Xenon Difluoride (XeF2) etching systems and their usefulness in the fabrication of MEMS and nanostructures. Despite numerous applications of pulsed vacuum systems, little
Autor:
Tyler J. Hieber, Mohammadhosein Ghasemi Baboly, Denise Pinon, T L Ward, Zayd C. Leseman, Dipta Sarkar, Austin Schuberth, Joseph D. Butner, Khawar Abbas, Mirza Elahi
Publikováno v:
Journal of Micromechanics and Microengineering. 28:045007
A technique is presented for determination of the depletion of the etchant, etched depth, and instantaneous etch rate for Si etching with XeF2 in a pulsed etching system in real time. The only experimental data required is the pressure data collected