Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Debra Fenzel-Alexander"'
Autor:
Gregory Breyta, R. Sooriyakumaran, Carl E. Larson, Qinghuang Lin, Karen Petrillo, Marie Angelopoulos, Juliann Opitz, Gregory M. Wallraff, D. LaTulip, Katherina Babich, John P. Simons, R. A. Dipietro, Mark H. Sherwood, Donald C. Hofer, Debra Fenzel-Alexander, J. Muete
Publikováno v:
Journal of Photopolymer Science and Technology. 11:673-679
Thin film imaging resists (TSI and Bilayer systems) confine the imaging to a thin resist film (in the case of a bilayer system) which is subsequently transferred to a thicker polymeric underlayer. This approach has a number of potential advantages in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7f8debc9c158a786adb50850114d5d5
https://doi.org/10.2494/photopolymer.11.673
https://doi.org/10.2494/photopolymer.11.673
Publikováno v:
Journal of Photopolymer Science and Technology. 10:397-407
This paper describes the dissolution behavior of phenolic resins and resists in aqueous base solutions as measured with a quartz crystal microbalance. The dissolution kinetics of poly(4-hydroxystyrene) is linear with time, irrespective of molecular w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f439dbb96ca5bb5849e1462fd43478e
https://doi.org/10.2494/photopolymer.10.397
https://doi.org/10.2494/photopolymer.10.397
Autor:
Debra Fenzel-Alexander, Don Hofer, Hiroshi Ito, Greg Breyta, Pete Hagerty, R. A. Dipietro, Ron Nunes, Will Conley, Jim Thackeray, S. Holmes
Publikováno v:
Journal of Photopolymer Science and Technology. 9:557-572
A production-worthy deep UV resist system built on the ESCAP platform is described. The resist consists of a thermally and hydrolytically stable resin and acid generator and thus can be heated at high temperatures forfree volume reduction, which prov
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fce82346f7288d945f45381b467dc36b
https://doi.org/10.2494/photopolymer.9.557
https://doi.org/10.2494/photopolymer.9.557
Publikováno v:
Journal of Polymer Science Part B: Polymer Physics. 29:1559-1565
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81ac36164b93d6d39ba1f5532af541f6
https://doi.org/10.1002/polb.1991.090291213
https://doi.org/10.1002/polb.1991.090291213
Autor:
Gregory M. Wallraff, Robert D. Allen, Debra Fenzel-Alexander, Nicolette Fender, Ratnam Sooriyakumaran
Publikováno v:
SPIE Proceedings.
We have designed and developed an aqueous base soluble polymer system with a silsequioxane (SSQ) backbone for 157nm bilayer resist applications. These base resins have absorbances as low as 0.6micrometers -1 at 157nm. The imagable polymers which cont
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f432d3366725161a3e54efe19360a9a
https://doi.org/10.1117/12.436861
https://doi.org/10.1117/12.436861
Autor:
Carl E. Larson, Richard A. Di Pietro, Phillip J. Brock, Marie Angelopoulos, Dan J. Dawson, Ratnam Sooriyakumaran, Arpan P. Mahorowala, Donald C. Hofer, Debra Fenzel-Alexander, Gregory M. Wallraff
Publikováno v:
Advances in Resist Technology and Processing XVII.
We have designed and developed a high resolution 193 nm bilayer resist system based on alternating copolymers of silane substituted norbornene and maleic anhydride. We have utilized a combination of acid labile silane functionalities and acid stable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::685df60dbbb43af23139d844e7241544
https://doi.org/10.1117/12.388282
https://doi.org/10.1117/12.388282
Autor:
Gregory Breyta, Marie Angelopoulos, Carl E. Larson, Ratnam Sooriyakumaran, Donald C. Hofer, Karen Petrillo, Phillip J. Brock, Douglas Charles Latulipe, Katherina Babich, Arpan P. Mahorowala, Debra Fenzel-Alexander, John P. Simons, David R. Medeiros, Gregory M. Wallraff, Qinghuang Lin, Richard A. Di Pietro
Publikováno v:
SPIE Proceedings.
Bilayer thin film imaging is one approach to extend 248 nm optical lithography to 150 nm regime and beyond. In this paper, we report our progress in the development of a positive-tone bilayer resist system consisting of a thin silicon containing imag
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a3d80828c53b14c1331d51fb6de0e2f7
https://doi.org/10.1117/12.350207
https://doi.org/10.1117/12.350207
Autor:
Qinghuang Lin, Carl E. Larson, Douglas C. LaTulip, Debra Fenzel-Alexander, Marie Angelopoulos, Ahmad D. Katnani, Karen Petrillo, Richard A. Di Pietro, Gregory M. Wallraff, Donald C. Hofer, Juliann Opitz, John P. Simons, Katherina Babich, Ratnam Sooriyakumaran
Publikováno v:
SPIE Proceedings.
We have designed and developed new silicon containing methacrylate monomers that can be used in bilayer resist systems. New monomers were developed because the commercially available silicon monomers were found to be unsuitable for our applications.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0acda25a0b6e947efc4d3c22f5561a6
https://doi.org/10.1117/12.312411
https://doi.org/10.1117/12.312411
Publikováno v:
Advances in Resist Technology and Processing XIV.
In this paper, experimental formulations of ESCAP photoresist with two different photoacid generators (PAG) are compared for x-ray and DUV (248 nm) exposures. Sensitivities, chemical contrasts and development selectivities have been derived from diss
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::570cc7167acdb85f9d0e6e9cfbd41dbc
https://doi.org/10.1117/12.275871
https://doi.org/10.1117/12.275871
Publikováno v:
Advances in Resist Technology and Processing XIV.
The thin film dissolution behavior of phenolic resins such as poly(4-hydroxystyrene) and poly(4-hydroxystyrene-co-t-butyl acrylate), the dissolution inhibition effect of acid generators, and the development kinetics of the ESCAP resist are reported.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d719add4ef3ad7ec94a55ef361dc815
https://doi.org/10.1117/12.275860
https://doi.org/10.1117/12.275860