Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Deborah Yellowaga"'
Publikováno v:
Molecular Modeling and Multiscaling Issues for Electronic Material Applications ISBN: 9781461417279
This work describes the surface energy and reactivity modeling of the Honeywell cleaner technology that has demonstrated an inorganic Bottom Anti-Reflective Coating removal solution with significantly higher removal rates and etching selectivity comp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdbc2c9a4ce607c7e132782727e504ec
https://doi.org/10.1007/978-1-4614-1728-6_3
https://doi.org/10.1007/978-1-4614-1728-6_3
Autor:
Mehari Stifanos, Amanuel Gebrebrhan, Nancy Iwamoto, Ahila Krishnamoorthy, Deborah Yellowaga, Edward W. Rutter, Richard Spear, Emma Brouk
Publikováno v:
EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems.
Molecular modeling was employed to understand various properties found in thick film dielectric layers derived from solution-based sol-gel formulation in order to aid their development. For instance, for formulations used as planarizing layers, it wa
Autor:
Ahila Krishnamoorthy, Richard Spear, Deborah Yellowaga, Amanuel Gebrebrhan, Hai Bien, Marie Lowe, Peter Smith, Mehari Stifanos
Publikováno v:
MRS Proceedings. 1030
Traditional plasma based dielectric films are conformal and cost-prohibitive for large displays. Solution based dielectrics are planarizing in nature and provide a flat surface for indium tin oxide (ITO) layer with the resultant uniform liquid crysta
Publikováno v:
2007 International Conference on Thermal, Mechanical and Multi-Physics Simulation Experiments in Microelectronics and Micro-Systems. EuroSime 2007.
The invention of inorganic bottom anti-reflective coatings (BARCs) was a promising enabling technology for lithography due to their near unity plasma etch selectivities with the low-k dielectric materials used in advanced via first trench last (VFTL)
Autor:
Marie Lowe, Amanuel Gebrebrhan, Scott K. Ageno, Shawn M. O'Rourke, Michael Marrs, Ahila Krishnamoorthy, Deborah Yellowaga, Doug Loy, Peter Smith, Richard Spear, Hai Bien, Jeff Dailey, Mehari Stifanos
Publikováno v:
SID Symposium Digest of Technical Papers. 39:140
Organosiloxane based spin on planarizing dielectrics (PTS-E and PTS-R) were developed for application in flat panel displays as a replacement to conformal chemical vapor deposited SiNx. Here we demonstrate the successful use of siloxane-based materia