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pro vyhledávání: '"Deanna Soucie"'
Autor:
Koichi Miyauchi, Deanna Soucie, Robert L. Brainard, William Earley, Brian Cardineau, Arata Takahashi, Takashi Aoki, Kenji Hosoi
Publikováno v:
Journal of Photopolymer Science and Technology. 30:351-359
Autor:
Takashi Aoki, Koichi Miyauchi, Brian Cardineau, Jay Chun, Arata Takahashi, Robert L. Brainard, Michael O’Sullivan, William Earley, Kenji Hosoi, Deanna Soucie
Publikováno v:
SPIE Proceedings.
The synthesis and lithographic evaluation of 193-nm and EUV photoresists that utilize a higher-order reaction mechanism of deprotection is presented. Unique polymers utilize novel blocking groups that require two acid-catalyzed steps to be removed. W