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pro vyhledávání: '"Dean Writer"'
Autor:
Denis J Poley, Katherine C. Norris, John L. Sturtevant, Steven J. Holmes, Stephen E. Knight, Karey L. Holland, Dean Writer, Andy Horr, Mark C. Hakey, Paul A. Rabidoux, J. Guidry, Dean C. Humphrey, Diana D. Dunn, Albert S. Bergendahl, D. Macaluso
Publikováno v:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II.
Lithographers have steadily reduced exposure wavelength and increased numerical aperture (NA) to maintain process window and simplicity. The G-line systems of the 1970s gave way to the I-line systems of the late 80s, and then to the deep ultraviolet
Publikováno v:
SPIE Proceedings.
This paper describes the computer simulation results of 0.5 micrometers lithography for a 16 Mb DRAM. The model demonstrates, via aerial profiles, the increased focus latitude for deep- ultraviolet (DUV) lithography as compared to i-line lithography.
Conference
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