One Mask Process For Stress-buffer And Passivation Applications Using Photosensitive Benzocyclobutene.

Autor: Strandjord, A.J.G., Rogers, W.B., Ida, Y., Shiau, S., Moyer, E.S., Scheck, D.M., DeVellis, R.R., Garrou, P.E.

Publikováno v: IEMT/IMC Symposium, 1st Joint International Electronic Manufacturing Symposium & the International Microelectronics Conference; 1997, p261-266, 6p