Zobrazeno 1 - 10
of 30
pro vyhledávání: '"David V. Tsu"'
We investigate the basis for the Paradox where the Urbach-slope disorder parameter disagrees with the Raman width in amorphous diamond-like carbon (DLC) materials (lower Urbach-Eo yet greater Raman width). We examined the bandgap and Urbach-slope mea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d45195dc3cdf1a7642088a8b6d16da26
https://publica.fraunhofer.de/handle/publica/269828
https://publica.fraunhofer.de/handle/publica/269828
Publikováno v:
Surface and Coatings Technology. 336:39-53
We have developed a parametric analysis of diffuse scattering (haze) measured by integrating sphere, based on power law (‘B’) representation of changes in scattering intensity vs. NIR to UV wavelengths. The standard haze quantification method inv
Autor:
Takeo Ohta, David V. Tsu
Publikováno v:
Japanese Journal of Applied Physics. 45:6294-6307
A ZnS–SiO2 composite dielectric is widely used in the optical stack designs of rewritable optical recording media as an index-matching medium and as a protection layer for the high-index chalcogenide (compound with sixth group element of S, Se, Te)
Publikováno v:
Solar Energy Materials and Solar Cells. 78:115-141
In this report, we describe the nature of intermediate order in silicon as determined by recent measurements on thin films using transmission electron microscopy (TEM) and Raman scattering. The TEM images show in addition to the expected continuous r
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13:935-942
Neutral and ionic gas temperatures (Tn and Ti) are crucial parameters in the plasma processing of materials (etching and film deposition). Here we evaluate a method used for obtaining the temperatures, i.e., the Doppler broadening, of emission lines.
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 8:1947-1954
This paper describes the formation of heterostructure devices using multichamber integrated‐processing thin‐film deposition systems: clustered processing‐tools with UHV‐compatible inter‐chamber transfer. The application of remote plasma‐e
Publikováno v:
SPIE Proceedings.
We present our design and fabrication methodology of planar photonic crystal wavelength switches and the optical micro-bench surrounding them. The core device is a channel add-drop multiplexer (CADM) whose pass/transfer element can be turned off and
Publikováno v:
SPIE Proceedings.
We describe a method to achieve phased array steering at the near infrared (i.e., optical) frequencies used in telecommunication (1550 nm) as an alternative to physical movement of standard mirrors. A stationary and planar multilayer device utilizes
Publikováno v:
Scopus-Elsevier
A new back reflector comprised of an Al/(multi-layered stack)/ZnO structure is being developed to replace Al/ZnO used in manufacturing and boost conversion efficiencies with improved back reflector performance. Use of the multi-layered stack should l
Autor:
Stanford R. Ovshinsky, Benjamin S. Chao, S.J. Jones, Raphael Tsu, Subhendu Guha, David V. Tsu, Jeffrey Yang
Publikováno v:
Physical Review B. 63
Hydrogen $({\mathrm{H}}_{2})$ dilution of the source gas is known to be a key factor in producing hydrogenated amorphous silicon films that demonstrate a high degree of optoelectronic stability. In this work, we investigate, using Raman spectroscopy