Zobrazeno 1 - 10
of 12
pro vyhledávání: '"David Turcotte"'
Autor:
Linda Silka, Robert Forrant, Brenda Bond, Patricia Coffey, Robin Toof, Dan Toomey, David Turcotte, Cheryl West
Publikováno v:
Gateways, Vol 1, Iss 0, Pp 128-149 (2008)
A challenge that community-university partnerships everywhere will face is how to maintain continuity in the face of change. The problems besetting communities continually shift and the goals of the university partners often fluctuate. This article d
Externí odkaz:
https://doaj.org/article/5b6279fa016048628da1af0db8f000f8
Autor:
David Turcotte, Lau Kien Mun, Yousef Awad, Eric Lavallee, Pan Yang, D. Drouin, Melanie Cloutier, Jacques Beauvais
Publikováno v:
Thin Solid Films. 515:3040-3045
The effects of various pulse reversal plating parameters on the grain size and smoothness of Ni film on silver seed layers has been studied. The duty cycle, frequency, bath temperature and agitation methods have been tested. The objective was to form
Publikováno v:
The Quarterly Review of Economics and Finance. 44:710-726
This study presents how Hydro-Quebec manages its short-term financial risks. The quantitative hedging model is articulated over forward and volatility premia and constrained by a yearly risk limit provided by the firm's Finance Committee. The hedging
Autor:
Jacques Beauvais, Dominique Drouin, Melanie Cloutier, David Turcotte, Yousef Awad, Pan Yang, Pierre Lafrance, Eric Lavallee
Publikováno v:
Japanese Journal of Applied Physics. 41:4122-4126
In order to meet the long term goals of the International Technology Roadmap for Semiconductors, it is important to demonstrate that X-ray masks can be fabricated at resolutions well below the 100 nm barrier. This paper presents results on the use of
Autor:
Eric Lavallee, Hiroshi Nozue, Yousef Awad, Pan Yang, David Turcotte, Lau Kien Mun, Pierre Lafrance, R. Legario, Akira Yoshida, Melanie Cloutier, Jacques Beauvais, Dominique Drouin
Publikováno v:
SPIE Proceedings.
Masks for low energy electron proximity projection lithography (LEEPL) require thin membranes, which in turn make the development of low-distortion masks a critical issue for this technology. By using an evaporated resist, a flip side fabrication pro
Autor:
Eric Lavallee, R. Legario, Jacques Beauvais, Prasad Kelkar, Dominique Drouin, Pan Yang, Lau Kien Mun, Yousef Awad, Pierre Lafrance, David Turcotte, Melanie Cloutier
Publikováno v:
SPIE Proceedings.
A novel and effective approach to nano-fabrication lithography is the vapour deposition of the negative tone electron beam resists QSR-5 and QSR-15 (Quantiscript’s sterol based resist) onto a substrate. Vapour deposition is especially conducive for
Autor:
Prasad Kelkar, R. Legario, Pan Yang, M. Cloutier, D. Drouin, David Turcotte, E. Lavallee, J. Beauvais
Publikováno v:
Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.
In this paper, the resist is evaporated using conventional thermal evaporation. Thickness as small as 20 nm have been demonstrated, with surface roughness as small as 4 nm rms.
Publikováno v:
Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).
In recent years, efforts have been made to demonstrate the extensibility of X-ray lithography as a next-generation lithography technique for integrated circuit production (Canning, 1997; Oda et al, 1999). In order to meet the long term goals of the I
Publikováno v:
SAE Technical Paper Series.
Autor:
Prasad Kelkar, Pan Yang, Lau Kien Mun, Eric Lavallee, Jacques Beauvais, Dominique Drouin, R. Legario, Yousef Awad, Melanie Cloutier, Vincent Aimez, David Turcotte
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:743
Semiconductor micro and nanofabrication lithography techniques for application in microelectronics as well as in micromechanics and optoelectronics can gain significantly from using a dry resist process, since it enables the deposition of a very unif