Zobrazeno 1 - 10
of 319
pro vyhledávání: '"David N. Ruzic"'
Autor:
Nathan Bartlett, Andrew Herschberg, Gordon J. Crouse, Raquel Garza, Raj Ganeson, Tamar Dallal, Jake Nuttall, Linus Ringstad, David N. Ruzic
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Publikováno v:
Optical and EUV Nanolithography XXXV.
Autor:
Thanh H. Nguyen, Chamteut Oh, Zachary Jeckell, David N. Ruzic, Vishal Verma, Dhruval Patel, Joseph V. Puthussery
Publikováno v:
Plasma Medicine. 11:1-18
Wearing a mask population-wide is an important preventive measure in addressing COVID-19 and potential future pandemics. We showed how a household microwave oven, a coat-hanger, and a coffee cup can generate plasma that can be used to decontaminate N
Autor:
Zachary Jeckell, David E Barlaz, Thomas Houlahan, Wolfgang Huber, Ian Haehnlein, Brian Jurczyk, David N Ruzic
Publikováno v:
Physica Scripta. 98:015605
The effect on the ion energy distribution function (IEDF) of plasma produced during a high-power impulse magnetron sputtering (HiPIMS) discharge as the pulse conditions are varied is reported. Pressure was varied from 0.67–2.00 Pa (5–15 mTorr), p
Autor:
Dren Qerimi, Andrew C. Herschberg, Gianluca Panici, Parker Hays, Tyler Pohlman, David N. Ruzic
Publikováno v:
Journal of Applied Physics. 132:113302
Tin contamination of the collector mirror surface remains one of the crucial issues of EUV (Extreme Ultraviolet) sources, directly impacting the availability of the tool. Hydrogen plasma-based tin removal processes employ hydrogen radicals and ions t
Autor:
Z. Sun, David N. Ruzic, X.C. Meng, Mingguang Huang, Xianzu Gong, Qingxi Yang, B. N. Wan, Guizhong Zuo, Wenbo Xu, Kevin Tritz, Rajesh Maingi, Ming-Jiu Ni, East Team, Daniel Andruczyk, Jiansheng Hu, Jiuyuan Li
Publikováno v:
Nuclear Materials and Energy, Vol 18, Iss, Pp 99-104 (2019)
Liquid lithium (Li) can partly ameliorate lifetime and power-exhaust issues of plasma facing components (PFCs) by enabling a self-healing, self-replenishing surface with a reduced susceptibility to neutron damage in future fusion devices. To assess o
Autor:
Wolfgang Huber, Thomas Houlahan, Zachary Jeckell, David Barlaz, Ian Haehnlein, Brian Jurczyk, David N Ruzic
Publikováno v:
Plasma Sources Science and Technology. 31:065001
The time-dependent plasma properties of a high-power impulse magnetron sputtering plasma are investigated which include a positive ‘kick’ pulse on the sputtering target 2 μs after the main negative pulse, this reversing the voltage on the cathod
Autor:
José A. Rivera, Priya Raman, Thomas J. Houlahan, Ivan Shchelkanov, Justin Weberski, Wenyu Xu, David N. Ruzic, Rui Su, Matthew Cheng
Publikováno v:
Vacuum. 156:9-19
High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Ionized Physical Vapor Deposition (iPVD) technique that is capable of producing high quality, ultra-dense, wear-resistant, low-friction
Publikováno v:
Fusion Engineering and Design. 135:81-87
Recovery of tritium from plasma-facing components in fusion devices will be vital to future full-scale operation. Liquid, low-Z materials have demonstrated many inherent advantages over solid first wall materials. To this end, a thermal treatment met
Autor:
Fred Li, Niels Braaksma, Gianluca A. Panici, David N. Ruzic, Dren Qerimi, Jack Stahl, David C. Brandt, Igor V. Fomenkov
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
A hydrogen plasma cleaning technique to clean Sn (tin) off EUV collector optics is studied in detail. The cleaning process uses hydrogen radicals and ions (formed in the hydrogen plasma) to interact with Sn-coated surfaces, forming SnH 4 and being pu