Zobrazeno 1 - 10
of 21
pro vyhledávání: '"David L. Willenborg"'
Publikováno v:
Journal of Applied Physics. 73:7035-7040
Beam‐profile reflectometry is a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. The technique consists of measuring the intensity profile of a highly focused beam reflected from t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::48768c4f23519263efa25760bfc5ca43
https://doi.org/10.1063/1.352421
https://doi.org/10.1063/1.352421
Publikováno v:
Applied optics. 21(10)
The interferometer and viewing optics that are the main optical components of an automated surface mapping system used to characterize the surface topography and the wall thickness uniformity of opaque and transparent spherical shells are described.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b10a5da2818c6444123225fbcb4b155e
https://pubmed.ncbi.nlm.nih.gov/20389931
https://pubmed.ncbi.nlm.nih.gov/20389931
Publikováno v:
Applied Physics Letters. 60:1301-1303
We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry provides excellent precision for films as thin as 30 A and as thick as 20 000 A. The techniq
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2073fc9f51158a452cb69cc3342d332c
https://doi.org/10.1063/1.107323
https://doi.org/10.1063/1.107323
Publikováno v:
SPIE Proceedings.
We have developed a novel technique for performing simple phase-sensitive optical measurements in a sub-micrometer area. We presently use this technique to measure film stacks commonly found in the semiconductor industry. This article explains the th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2be99b53e46bb5e609c7e21e9fbf042
https://doi.org/10.1117/12.172605
https://doi.org/10.1117/12.172605
Autor:
Jeffrey T. Fanton, Jim P. Simmons, Allan Rosencwaig, Jon Opsal, S. M. Kelso, David L. Willenborg
Publikováno v:
SPIE Proceedings.
Measurements of ultra-thin films (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71815e372bad5013cddb912b8c07d906
https://doi.org/10.1117/12.56645
https://doi.org/10.1117/12.56645
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 21:537-541
Thermal wave technology has led to a new means of monitoring the dose and dose uniformity of ions implanted into wafers of silicon and gallium arsenide. New monitoring characteristics made available with this technique include nondestructive real-tim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac7aa30d268d9b6e6be0889d60071578
https://doi.org/10.1016/0168-583x(87)90899-8
https://doi.org/10.1016/0168-583x(87)90899-8
Publikováno v:
Le Journal de Physique Colloques. 44:C6-483
Technique nouvelle de deflexion d'un faisceau laser induite par une onde thermique permettant de mesurer des epaisseurs de couches opaques ou transparentes de 500 a 25000 A. Application a la mesure des epaisseurs de couches minces de Al ou SiO 2 depo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bde89ade1ba12d17e6cc6c00565adb30
https://doi.org/10.1051/jphyscol:1983679
https://doi.org/10.1051/jphyscol:1983679
Publikováno v:
Applied Physics Letters. 47:584-586
A new method, based on thermal wave technology, is used to monitor the ion implantation process in silicon. It is a noncontact, nondestructive technique that requires no special sample preparation or processing, has high sensitivity even at low dose,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5589ea5c9fbe81793db2e96618a8e58
https://doi.org/10.1063/1.96079
https://doi.org/10.1063/1.96079
Publikováno v:
Applied Physics Letters. 43:166-168
A method and apparatus for thin film thickness measurements with thermal waves in which heating and detection laser beams are focused onto the film, normal to the surface of the film, with the two beams parallel and non-coaxial.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbfa71fc847beda7fca35f5ba2163680
https://doi.org/10.1063/1.94267
https://doi.org/10.1063/1.94267
Publikováno v:
IEEE Journal of Quantum Electronics. 17:2416-2418
The interferometer and viewing optics that are the main optical components of an Automated Surface Mapping system (ASM) used to characterize the surface topography and the wall thickness uniformity of opaque and transparent spherical shells is descri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a828a28263631a5fd7772be3429b86b
https://doi.org/10.1109/jqe.1981.1070742
https://doi.org/10.1109/jqe.1981.1070742