Zobrazeno 1 - 10
of 10
pro vyhledávání: '"David K. Poon"'
Publikováno v:
SPIE Proceedings.
Bimetallic thin-films offer the ability of producing analog grayscale photomasks with OD ranging from ~3.0OD (unexposed) to
Autor:
Jimmy T. K. Tsui, Glenn H. Chapman, Chinheng Choo, Ash M. Parameswaren, James M. Dykes, Bonnie L. Gray, Dan Sameoto, Jun Wang, David K. Poon
Publikováno v:
Microfluidics, BioMEMS, and Medical Microsystems V.
Two methods were investigated for the creation of encapsulated micro-fluidic channels and bridges in negative tone SU-8 photoresist. The first uses two exposures at different wavelengths to create the channel sidewalls and microchannel encapsulation
Autor:
Marian Chang, David K. Poon, Glenn H. Chapman, Jimmy T. K. Tsui, Chinheng Choo, James M. Dykes, Jun Wang
Publikováno v:
2007 Canadian Conference on Electrical and Computer Engineering.
Metallic thin films can be fully oxidized by focused laser beams, resulting in their optical density (OD) changing from highly absorbing to very transparent. Previous research found the laser-induced partial oxidation process allows the creation of g
Autor:
Yuqiang Tu, Patrick Reynolds, David K. Poon, James M. Dykes, Jimmy T. K. Tsui, Jun Wang, Chinheng Choo, Glenn H. Chapman, Andrew Zanzal
Publikováno v:
SPIE Proceedings.
Recent work has shown that bimetallic films, such as Bi/In and Sn/In, can create laser direct-write grayscale photomasks. Using a laser-induced oxidation process; bimetallic films turn transparent with variations in optical transparency that are a fu
Publikováno v:
SPIE Proceedings.
Bimetallic Bi/In films demonstrate grayscale levels after exposed with different laser powers due to controlled film oxidation. Although large optical density (OD) change from 3.0 OD to 0.22 OD at 365 nm was observed, these films show a rapid and non
Publikováno v:
Photon Processing in Microelectronics and Photonics V.
DC-sputtered Sn/In and Bi/In bimetallic thin films oxidize and turn transparent under laser exposure. The film's transparency, or optical density (OD), changes smoothly with increasing laser power, from ~3.0OD (unexposed) to
Publikováno v:
Photon Processing in Microelectronics and Photonics V.
Previous research showed that bimetallic Bi/In and Sn/In films exhibit good grayscale levels after laser exposure due to controlled film oxidation. While giving a large alteration in optical density (OD) from 3.0OD to 0.22OD at 365 nm, Bi/In and Sn/I
Publikováno v:
SPIE Proceedings.
Bimetallic thin films have been proven to be effective in creating analog direct write grayscale photomasks. DC-sputtered Bi/In or Sn/In oxidizes under laser writing exposure. The optical density decreases from >3OD as deposited to a transparency of
Autor:
Jun Wang, James M. Dykes, Jun Peng, Chinheng Choo, Glenn H. Chapman, David K. Poon, Yuqiang Tu, Willy Lennard, Karen L. Kavanagh
Publikováno v:
SPIE Proceedings.
Bimetallic films have been found to be promising direct write binary and grayscale photomask materials, as they turn transparent after laser exposure. Current structural analysis shows that the laser exposure is an oxidation process. The amount of th
Publikováno v:
SPIE Proceedings.
Bimetallic thin films were previously shown to create laser direct write binary and analog gray scale photomasks. DC-sputtered Sn/In (5at.% Sn, 80 nm) oxidize under laser exposure, modifying the optical density at 365 nm from >3OD to