Zobrazeno 1 - 10
of 12
pro vyhledávání: '"David J. Brzozowy"'
Autor:
Peter D. Rhyins, Patrick M. Martin, B. A. Blachowicz, Christopher J. Progler, David J. Brzozowy, Thomas Kocab, Scott Bowdoin, Chris Carney, Brian Tyrrell, Susan G. Cann, Michael Fritze
Publikováno v:
SPIE Proceedings.
Image placement errors and their effect on process latitude are a remaining issue in the development of strong phase shift mask technology. In this work, we will review the various causes of image placement error for strong phase shift imaging, inclu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31a504bd3b391dec736a560e46ecacdf
https://doi.org/10.1117/12.474592
https://doi.org/10.1117/12.474592
Autor:
David J. Brzozowy, Medhat A. Toukhy
Publikováno v:
Advances in Resist Technology and Processing XIV.
The optimization of a resist formulation for performance robustness in addition to its basic lithographic performance provides added tolerance to formulation errors. This was demonstrated in this paper by the example of OiR-32 resist technology. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc5d308194ed480d56b6f55bac855b7a
https://doi.org/10.1117/12.275838
https://doi.org/10.1117/12.275838
Publikováno v:
Advances in Resist Technology and Processing XIV.
The addition of selected PACs to resists comprised of selectively esterified DNQ novolacs improves their performance in terms of side wall angle and resolution compared to resists whose photoactive component is composed of entirely selectively esteri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7a23eabc5d5cc52cb439e596c5c5c61
https://doi.org/10.1117/12.275876
https://doi.org/10.1117/12.275876
Autor:
Bernard T. Beauchemin, David J. Brzozowy, Edward A. Fitzgerald, Alfred T. Jeffries, Paula M. Gallagher-Wetmore, Ahmad A. Naiini
Publikováno v:
SPIE Proceedings.
Supercritical fluids were used to fractionate a conventional 60 meta/40 para cresol novolac into five narrow polydispersivity fractions. Single and multiple fractions were esterified with a DNQ moiety and recombined to obtain a resist having essentia
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::963ed6532e8ef2920ace7b3d9bb07a04
https://doi.org/10.1117/12.241845
https://doi.org/10.1117/12.241845
Publikováno v:
SPIE Proceedings.
The interesting phenomenon of CD undersizing has been predicted by simulations to occur in high contrast/high exposure margin resists imaged with high numerical aperture steppers. Under these conditions the out-of-focus images of dense arrays, which
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86bfc7dcba5b4d82a078e0c1c70a043c
https://doi.org/10.1117/12.210389
https://doi.org/10.1117/12.210389
Autor:
David J. Brzozowy, Patricia Scialdone, Medhat A. Toukhy, Rodney J. Hurditch, Steven G. Hansen, Karin R. Schlicht, Peggy M. Spragg
Publikováno v:
Advances in Resist Technology and Processing XI.
Photospeed measures of functional performance are widely employed for the characterization, quality control, and quality assurance of photoresists in both their manufacture and end use. In this paper we investigate from both a theoretical and experim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::caa4fb1ccde43c5f052b7845745ae333
https://doi.org/10.1117/12.175375
https://doi.org/10.1117/12.175375
Publikováno v:
Advances in Resist Technology and Processing X.
In an effort to improve the performance of positive resists by increasing the amounts of o,o- bonding, some m-/p-cresol novolacs were prepared in which a portion of the p-cresol was replaced by 2,6-bishydroxymethyl-p-cresol (BHMPC). This work disting
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::859839279e2bf186b39e0aa4e2f7fdeb
https://doi.org/10.1117/12.154757
https://doi.org/10.1117/12.154757
Publikováno v:
Advances in Resist Technology and Processing X.
Thin film optical interference causes a sinusoidal variation in lithographic properties with film thicknessknown as the swing effect. The most well known manifestations are the threshold clearing energy (Ej) andcritical dimension (CD) swings which ar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::70ea24bf0339613e6772352dbc0bf849
https://doi.org/10.1117/12.154798
https://doi.org/10.1117/12.154798
Publikováno v:
Advances in Resist Technology and Processing VIII.
The strategy and chemistry employed to develop high resolution, high temperature positive resist systems (flow temperature >= 140 degree(s)C) based on novolak resin chemistry are reviewed and compared in this paper. Modest gains in resist thermal flo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8572bc59e7ee7b6c187fb94fecf8e203
https://doi.org/10.1117/12.46398
https://doi.org/10.1117/12.46398
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