Zobrazeno 1 - 10
of 35
pro vyhledávání: '"David J, Mandia"'
Autor:
Duck Young Chung, Hyowon Park, David J. Mandia, Xiuquan Zhou, Lei Yu, Andrey A. Yakovenko, Mahalingam Balasubramanian, Mercouri G. Kanatzidis, Jianguo Wen
Publikováno v:
Journal of the American Chemical Society. 143:13646-13654
Molten salts are promising reaction media candidates for the discovery of novel materials; however, they offer little control over oxidation state compared to aqueous solutions. Here, we demonstrated that when two hydroxides are mixed, their melts be
Autor:
Rebecca L. Peterson, Jaesung Jo, Neil P. Dasgupta, Orlando Trejo, David J. Mandia, Julia D. Lenef
Publikováno v:
The Journal of Physical Chemistry C. 125:9383-9390
Metal oxide semiconductors are important due to their diverse set of applications in (opto)electronics including light-emitting diodes, solar cells, and thin film transistors (TFTs). However, compa...
Autor:
David J. Mandia, Olaf J. Borkiewicz, Xiang He, Seth B. Darling, Nestor J. Zaluzec, Uta Ruett, Nari Jeon, Ruben Z. Waldman, David M. Tiede, Alex B. F. Martinson
Publikováno v:
ACS Nano. 14:14846-14860
Sequential infiltration synthesis (SIS) is a route to the precision deposition of inorganic solids in analogy to atomic layer deposition but occurs within (vs upon) a soft material template. SIS has enabled exquisite nanoscale morphological complexit
Autor:
Seth B. Darling, Matthew Tirrell, Wei Chen, Yijun Qiao, Shenglong Gan, Qiming He, Hua Zhou, Huiru Zhang, Jeffrey W. Elam, David J. Mandia
Publikováno v:
Langmuir. 35:17082-17089
Cysteine-based polyzwitterionic brushes have been prepared via a two-step route. First, poly(allyl methacrylate) (PAMA) brushes have been grown from the surface of silicon substrates using surface-initiated atom transfer radical polymerization. The o
Autor:
Anil U. Mane, Devika Choudhury, Jeffrey W. Elam, David J. Mandia, Maximilian Gebhard, Angel Yanguas-Gil, Alfred P. Sattelberger, Steven Letourneau
Publikováno v:
Chemistry of Materials. 31:7821-7832
We present the full investigation of the atomic layer deposition (ALD) of a mixed rhenium–aluminum oxide, namely ReAl2O3CH3, a material with tunable resistance, comprising the building unit of cond...
Autor:
Seth B. Darling, Nari Jeon, Alex B. F. Martinson, Ruben Z. Waldman, Olle Heinonen, David J. Mandia
Publikováno v:
Chemistry of Materials. 31:5274-5285
The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In2O3 and Ga2O3) into poly(methyl methacrylate) (PMMA) thin films is demonstrated using trimethylindium (TMIn) and trimethylgallium (TMGa), respectively, with water. I
Publikováno v:
ACS Applied Materials & Interfaces. 11:11602-11611
Titanium nitride (TiN) is a unique refractory plasmonic material, the nanocomposites and alloys of which provide further opportunities to tailor its optical and photonic properties. We prepare TiAlN films of continuously variable compositions through
Autor:
Matthias J. Young, Aaron W. Peters, Lin Zhang, Omar K. Farha, Jian Liu, Zhanyong Li, Xuan Zhang, Joseph T. Hupp, David J. Mandia, Steven Letourneau, Jeffrey W. Elam, Nicholas M. Bedford, Ken-ichi Otake
Publikováno v:
ACS Catalysis. 9:3198-3207
Previous work has shown that introduction of hexafluoroacetylacetone (Facac) units as nonstructural ligands for the zirconia-like nodes of the eight-connected metal–organic framework (MOF), NU-1000, greatly alters the selectivity of node-supported
Autor:
Matthias J. Young, Jeffrey W. Elam, Steven M. George, Bachir Aoun, Angel Yanguas-Gil, Andrew S. Cavanagh, Matthew W. Coile, Nicholas M. Bedford, Steven Letourneau, David J. Mandia
Publikováno v:
ACS applied materialsinterfaces. 12(20)
Atomic layer deposition (ALD) is a well-established technique for depositing nanoscale coatings with pristine control of film thickness and composition. The trimethylaluminum (TMA) and water (H2O) ALD chemistry is inarguably the most widely used and
Autor:
Seth B. Darling, Devika Choudhury, Jeffrey W. Elam, Alex B. F. Martinson, Paul F. Nealey, David J. Mandia, Ruben Z. Waldman
Publikováno v:
JOM. 71:212-223
We report the sequential infiltration synthesis (SIS) of aluminum oxide (Al2O3) into polyethersulfone (PES) ultrafiltration (UF) membranes to form hybrid nanocomposites. SIS relies on chemical interactions between precursor vapors and polymer functio