Zobrazeno 1 - 10
of 322
pro vyhledávání: '"David Cuthbert"'
Autor:
Hsin-pei (Spencer) Hu, Mohammad Gouran-Savadkoohi, Gregory Anagnostopoulos, Ian S. Dayes, Adrian Ishkanian, Abhirami Hallock, Thomas B Corbett, Himanshu Lukka, Kimmen Quan, Kara Schnarr, David Cuthbert, Mira Goldberg, Theodoros Tsakiridis
Publikováno v:
Journal of Clinical Oncology. 41:363-363
363 Background: SBRT uses highly conformal radiotherapy to deliver high dose per fraction treatment. Advantages of SBRT include short treatment times, decreased costs and limited toxicity. Randomized trial outcomes of 7-fraction SBRT for low or inter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2477beec0185bf5d5d18e10ceac8dbb7
https://doi.org/10.1200/jco.2023.41.6_suppl.363
https://doi.org/10.1200/jco.2023.41.6_suppl.363
Publikováno v:
Hudson Valley Business Journal. 10/24/2011, Vol. 22 Issue 43, p21-21. 1/3p.
Autor:
Lehana Thabane, Kimmen Quan, Mira Goldberg, Peter A. Kavsak, Tom Chow, Kara Schnarr, Kevin R. Diamond, James R. Wright, Abhirami Hallock, H. Lukka, Anand Swaminath, Naghmeh Isfahanian, David Cuthbert, IanDayes, Jean-Claude Cutz, Adrian Ishkanian, Theodoros Tsakiridis, Georgia Douvi
Publikováno v:
Radiotherapy and Oncology. 150:S87-S88
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c003bbcf9034d39b83d0ecacf331a050
https://doi.org/10.1016/s0167-8140(20)31098-7
https://doi.org/10.1016/s0167-8140(20)31098-7
Autor:
David Cuthbert
Publikováno v:
Canadian Review of American Studies. 36:249-256
The essays collected in this issue emerged out of the Canadian Association for American Studies conference held in Winnipeg in October 2003. The conference’s program was organized around the topics ‘‘Authenticity and Contention’’ because, a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2dd81805edbc093a6233b7943c7becf7
https://doi.org/10.3138/cras-s036-03-01
https://doi.org/10.3138/cras-s036-03-01
Autor:
David Cuthbert
Publikováno v:
University of Toronto Quarterly. 65:393-403
The migration of the tag 'cultural studies' across national borders and onto an increasing number of book jackets, course calendars, conference notices, and journal issues suggests the possibility of an emerging consensus on the kind of practice that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44994b6eea740993720283b4a27b6e75
https://doi.org/10.3138/utq.65.2.393
https://doi.org/10.3138/utq.65.2.393
Publikováno v:
Baker & Taylor Author Biographies; 1/4/2000, p1-1, 1p
Publikováno v:
International Symposium on VLSI Technology, Systems and Applications.
Application of the photocleave technique in stepper-based lithography for nondestructively examining the size and shape of submicron contact windows defined in photoresist during VLSI (very-large-scale integration) processing is described. It involve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::89f1653528fec3f0ed888ee5cf3973c3
https://doi.org/10.1109/vtsa.1989.68642
https://doi.org/10.1109/vtsa.1989.68642
Autor:
C.C. Fu, John David Cuthbert, T.E. Adams, J.G. Costigan, Tungsheng Yang, D.E. Schrope, J.L. Ryan, T.M. Wolf, D.R. Stone
Publikováno v:
1991 International Symposium on VLSI Technology, Systems, and Applications - Proceedings of Technical Papers.
A cost-effective 0.5 mu m lithographic capability has been developed using a reduction stepper with a 0.45 Na i-line lens and new photoresists. Resist processes provide excellent CD and sidewall angle control, with satisfactory exposure latitude. Res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a85992b43b0d5142051f6f2576cbe229
https://doi.org/10.1109/vtsa.1991.246719
https://doi.org/10.1109/vtsa.1991.246719
Publikováno v:
SPIE Proceedings.
Application of the nondestructive Photocleave Technique for determining the shape and size of sub-micron contact windows defined in photoresist is described. Stepper-based printing in positive photoresist is assumed. Following conventional exposure o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27a75772c4f203f12d03cad2f359bb28
https://doi.org/10.1117/12.953080
https://doi.org/10.1117/12.953080