Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Dave Gerold"'
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::04078dbbc336cf656465c5de57cfa3a5
https://doi.org/10.1117/12.2657538
https://doi.org/10.1117/12.2657538
Autor:
Dave Gerold, Ray T. Chen
Publikováno v:
Applied optics. 35(3)
A new method for producing graded-index (GRIN) profiles on type A photolime gel-based polymer waveguides with vacuum drying is demonstrated. Vacuum drying allows optical waveguides to be built on substrates with a higher index of refraction without i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e4659ba24f43b1d7b3f60d957a81af89
https://pubmed.ncbi.nlm.nih.gov/21069024
https://pubmed.ncbi.nlm.nih.gov/21069024
Autor:
Robert Lugg, James P. Shiely, Rick Farnbach, Mike Rieger, Dave Gerold, Matt St. John, Randy Brown, Kevin Lucas, Josh Tuttle
Publikováno v:
SPIE Proceedings.
The upcoming 45nm device node is a point at which newer field-based (i.e., dense pixel-based) OPC simulation methods may begin to show advantages over sparse-sampling ("flash") simulation methods. Field-based simulation provides computational efficie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::103f183cca5041f8cff7fa9ca6cab4a6
https://doi.org/10.1117/12.721593
https://doi.org/10.1117/12.721593
Publikováno v:
SPIE Proceedings.
An integrated methodology for developing recipes for optical proximity correction (OPC) is demonstrated. A complete implementation of software programs for generating the OPC corrections, determining mask and layout errors and automatically displayin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71ed73cd9ef9bfa0752aef03c789a276
https://doi.org/10.1117/12.633172
https://doi.org/10.1117/12.633172
Publikováno v:
SPIE Proceedings.
For leading edge technologies, mask critical dimension (CD) errors consume a substantial part of the total wafer CD budget. Moreover, the strong optical proximity effects (OPE) can make the impact of a CD error on the mask significantly worse on wafe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd8eee2e6598d6e22f082f546d7e0041
https://doi.org/10.1117/12.617519
https://doi.org/10.1117/12.617519
Publikováno v:
Applied Physics Letters. 66:2631-2633
An electro‐optic polymer with chlorophenol red dye and type‐A photolime gel was demonstrated. The electro‐optic coefficient γ33 in the direction of the poling field was measured to be 28 pm/V. Chlorophenol red in polymer showed a 1/e relaxatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38d5545cdb62d5e3872b23fd9c02012f
https://doi.org/10.1063/1.113107
https://doi.org/10.1063/1.113107
Publikováno v:
Applied Physics Letters. 65:1070-1072
Experimental results of 1‐to‐2 intraplane and of 1‐to‐32 interplane V‐shaped fanouts are delineated. Coupling efficiencies of 48% for surface‐normal and of 45% for near‐surface‐normal interplane fanout beams are theoretically and expe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b515ac48e409061e3b9a995225647582
https://doi.org/10.1063/1.112176
https://doi.org/10.1063/1.112176
Autor:
Ray T. Chen, Dave Gerold
Publikováno v:
SPIE Proceedings.
A new method using vacuum-drying is demonstrated for producing graded index (GRIN) profiles on type-A photolime gel-based polymer waveguides. Vacuum-drying allows optical waveguides to be built on higher index of refraction substrates without interme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7df765ad773797d8e335bef52079eb28
https://doi.org/10.1117/12.190918
https://doi.org/10.1117/12.190918