Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Dara Bobb-Semple"'
Autor:
Richard G. Closser, William Trevillyan, Tzu-Ling Liu, Stacey F. Bent, Dara Bobb-Semple, Xiaoyun Yu, Il Kwon Oh
Publikováno v:
Chemistry of Materials. 33:902-909
Area-selective deposition (ASD) of low-k materials is desired in back-end-of-line processes for fabricating nanopatterns such as fully self-aligned vias. However, the high temperature and/or aggres...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e178060ecfc51864123a5c553c74b2d1
https://doi.org/10.1021/acs.chemmater.0c03668
https://doi.org/10.1021/acs.chemmater.0c03668
Publikováno v:
Journal of Materials Research. 36:582-591
An area-selective atomic layer deposition (AS-ALD) process is developed that achieves increased selectivity by combining two strategies: i) selective enhancement using a small molecule activator and ii) self-assembled monolayer (SAM)-based inhibition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bd07487257d7bfa8830a07549700e76f
https://doi.org/10.1557/s43578-020-00013-4
https://doi.org/10.1557/s43578-020-00013-4
Autor:
Dara Bobb-Semple, Li Zeng, Dennis Nordlund, David S. Bergsman, Stacey F. Bent, Isvar A. Cordova
Publikováno v:
Langmuir. 36:12849-12857
For years, many efforts in area selective atomic layer deposition (AS-ALD) have focused on trying to achieve high-quality self-assembled monolayers (SAMs), which have been shown by a number of studies to be effective for blocking deposition. Herein,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9e7a968a48c23c84900355344b9d7919
https://doi.org/10.1021/acs.langmuir.0c01974
https://doi.org/10.1021/acs.langmuir.0c01974
Publikováno v:
Chemistry of Materials. 31:1635-1645
Area-selective atomic layer deposition (AS-ALD) is a promising “bottom-up” alternative to current nanopatterning techniques. Self-assembled monolayers (SAM) have been successfully employed as deact...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1985c9dffa659f90842f9e1fe0b6d5e6
https://doi.org/10.1021/acs.chemmater.8b04926
https://doi.org/10.1021/acs.chemmater.8b04926
Autor:
Crystal S. Lewis, Christopher Koenigsmann, Miomir B. Vukmirovic, Lei Wang, Dara Bobb-Semple, Megan E. Scofield, Jing Tao, Radoslav R. Adzic, Yimei Zhu, Stanislaus S. Wong, Xiao Tong
Publikováno v:
Catalysis Science & Technology. 6:2435-2450
The performance of electrode materials in conventional direct alcohol fuel cells (DAFC) is constrained by (i) the low activity of the catalyst materials relative to their overall cost, (ii) the poisoning of the active sites due to the presence of par
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fefae082484700efc8ba4a25f99bb8b6
https://doi.org/10.1039/c5cy01444a
https://doi.org/10.1039/c5cy01444a
(Invited) Area Selective Atomic Layer Deposition As an Emerging Process for Advanced Nanofabrication
Publikováno v:
ECS Meeting Abstracts. :1186-1186
The rapid growth of technologies such as artificial intelligence and autonomous vehicles is fueling a need for more powerful electronic chips, which the semiconductor industry is working to meet with ever-more complex nanoscale device structures. Wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55debd99c24bc0836fa83cebc3ddcda8
https://doi.org/10.1149/ma2019-01/23/1186
https://doi.org/10.1149/ma2019-01/23/1186
Autor:
Yeongin Kim, Ludovic Godet, Yin Fan, Joseph A. Singh, Fatemeh Sadat Minaye Hashemi, Dara Bobb-Semple, Stacey F. Bent, Adriaan J. M. Mackus, Woo-Hee Kim, Tobin Kaufman-Osborn
Publikováno v:
ACS nano. 10(4)
Area-selective atomic layer deposition (AS-ALD) is attracting increasing interest because of its ability to enable both continued dimensional scaling and accurate pattern placement for next-generation nanoelectronics. Here we report a strategy for de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cb4cb821c49c90aef8e724637c14a04b
https://pubmed.ncbi.nlm.nih.gov/26950397
https://pubmed.ncbi.nlm.nih.gov/26950397
Autor:
Tian Yu, Stanislaus S. Wong, Megan E. Scofield, Daniel A. Fischer, Dara Bobb-Semple, Jing Tao, Mark Croft, Cherno Jaye, Trevor A. Tyson
Monodispersed strontium titanate nanoparticles were prepared and studied in detail. It is found that ∼10 nm as-prepared stoichiometric nanoparticles are in a polar structural state (possibly with ferroelectric properties) over a broad temperature r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13c2b260ec9227144997965e22199abc
Publikováno v:
ACS applied materialsinterfaces. 5(12)
We report for the first time (a) the synthesis of elemental ruthenium nanowires (Ru NWs), (b) a method for modifying their surfaces with platinum (Pt), and (c) the morphology-dependent methanol oxidation reaction (MOR) performance of high-quality Pt-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a295f2213e294e691b03f9e206f2eb41
https://pubmed.ncbi.nlm.nih.gov/23742154
https://pubmed.ncbi.nlm.nih.gov/23742154