Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Daniela White"'
Publikováno v:
Solid State Phenomena. 282:278-283
Chemical Mechanical Planarization (CMP) is a key process for IC manufacturers. Tungsten (W) is an important material for connecting logic elements and for connecting memory elements, thanks to its excellent planarization, filling, mechanical and elec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fff4e24afa87d77dcbc119e322a3628
https://doi.org/10.4028/www.scientific.net/ssp.282.278
https://doi.org/10.4028/www.scientific.net/ssp.282.278
Autor:
Daniela White, Tal Joseph
Publikováno v:
ECS Journal of Solid State Science and Technology. 10:024006
The ongoing demands for increased storage capacity flash memory in 2D-NAND structures resulted in their replacement by more advanced 3D-NAND structures, with the memory cells made of multiple, vertically stacked silicon oxide/silicon nitride layers.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d6b39a995e8d697534c1e2de762eb2a
https://doi.org/10.1149/2162-8777/abe422
https://doi.org/10.1149/2162-8777/abe422
Autor:
Daniela White, Ruben R. Lieten, Shi Ning Jenq, Herbert Struyf, Thomas Parson, Donald Frye, Lieve Teugels, Michael White
Publikováno v:
Solid State Phenomena. 255:186-194
We discuss several mechanistic approaches and experimental data for improving post-CMP cleaning of W plugs with TiN as barrier liner, and dielectric substrates SiO2 and Si3N4 for use at the 10 nm technology node (metal pitch of 40 nm). Particle charg
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25172c4b7f9f060bf735a19d8f51541e
https://doi.org/10.4028/www.scientific.net/ssp.255.186
https://doi.org/10.4028/www.scientific.net/ssp.255.186
Autor:
Daniela, White, Sason, Tavakoli
Publikováno v:
Annals of clinical psychiatry : official journal of the American Academy of Clinical Psychiatrists. 27(3)
Repetitive transcranial magnetic stimulation (rTMS) has shown promising results in treating individuals with behavioral disorders such as major depressive disorder (MDD), posttraumatic stress disorder, obsessive-compulsive disorder, and social anxiet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::a1ce896828158a9fcee962da4f6ba2a2
https://pubmed.ncbi.nlm.nih.gov/26247218
https://pubmed.ncbi.nlm.nih.gov/26247218
Autor:
Daniela White, Krzysztof Matyjaszewski
Publikováno v:
Journal of Macromolecular Science, Part A. 34:221-224
Effect of water and oxygen on the polymerization of vinyl acetate initiated by aluminum alkyls, bipyridyls and TEMPO is reported. Reactions with nearly complete exclusion of water and oxygen is very slow and provides a mixture of oligomers in a few h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54d51c525b2345ff0972706fe5a3d0eb
https://doi.org/10.1080/10601329708014949
https://doi.org/10.1080/10601329708014949
Publikováno v:
MRS Proceedings. 1249
In this presentation we will discuss polishing performance and related mechanistic aspects of several low solids, low or high pH slurries based on Lewis acids abrasives (TiO2, ZrO2, CeO2), activated by cationic homopolymers, and copolymers with acryl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4dd70a7b627afa2f817b23a9611caaa3
https://doi.org/10.1557/proc-1249-e03-09
https://doi.org/10.1557/proc-1249-e03-09
Publikováno v:
MRS Proceedings. 1249
Difficulties and challenges have been widely encountered in the chemical mechanical planarization (CMP) of noble metals used as diffusion barrier films due to hardness, chemical inertness and toxic oxidation products, in particular for Ru polishing.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e158ce99469b6b69a81564ee5e8e1e0
https://doi.org/10.1557/proc-1249-e04-04
https://doi.org/10.1557/proc-1249-e04-04
Publikováno v:
MRS Proceedings. 991
Nanoparticles provide multiple functionalities to the performance of CMP slurries. These include mechanical surface abrasion, mass transport of slurry chemistries between the pad and wafer surface, or increased chemical reactivity of some key additiv
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ff0441d92ed23ba96941681947c6c19
https://doi.org/10.1557/proc-0991-c05-05
https://doi.org/10.1557/proc-0991-c05-05
Autor:
Kim Dean, Victoria L. Graffenberg, David R. Stark, Georgia K. Rich, Andrew J. Blakeney, Thomas Steinhaeusler, Allen H. Gabor, Daniela White, Daniel Miller
Publikováno v:
SPIE Proceedings.
The 193 nm photoresist generation will need several technological approaches in order for it to be successfully integrated into manufacturing. These approaches include bilayer, single layer and top surface imaging resists. Bilayer resists offer the a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f431683ee39f6ae35824a2f8d79554c0
https://doi.org/10.1117/12.312373
https://doi.org/10.1117/12.312373
Publikováno v:
SPIE Proceedings.
Thermal decomposition of silyl substituted methacrylate terpolymers containing acid sensitive groups was studied using thermogravimetric analysis. The onset of decomposition was found to be a function of the microenvironment, i.e. the molar % composi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b507a59426b2e0891cc8cf6e95c0758
https://doi.org/10.1117/12.312383
https://doi.org/10.1117/12.312383