Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Daniel P. Zachry"'
Autor:
R. R. Greco, Bibhudutta Rout, Gary A. Glass, Elia V. Eschenazi, Alexander D. Dymnikov, Yongqiang Wang, Daniel P. Zachry
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 261:731-735
As high energy ions travel through a crystalline semiconductor materials they produce damage along the path which results in resistance to some of the wet chemical etching. A series of preliminary experiments have been performed at the Louisiana Acce
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 260:366-371
Deep buried layered microstructures have many potential applications as sensors, micro-electro-mechanical systems (MEMS), and optical devices, but it has always been challenging to obtain a minimum number of process steps to produce these structures.
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 260:372-377
The high energy focused ion beam (HEFIB) system at the Louisiana Accelerator Center (LAC) of the University of Louisiana at Lafayette, Lafayette, USA, is constructed on one of the beamlines of a National Electrostatics Corporation 1.7 MV 5SDH-2 tande
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 250:76-80
Energetic (MeV) Au implantation in Si(1 0 0) (n-type) through masked micropatterns has been used to create layers resistant to KOH wet etching. Microscale patterns were produced in PMMA and SU(8) resist coatings on the silicon substrates using P-beam
Autor:
Bibhudutta Rout, Elia V. Eschenazi, Alexander D. Dymnikov, Daniel P. Zachry, Gary A. Glass, R. R. Greco
Publikováno v:
MRS Proceedings. 908
An overview of the present state of high energy focused ion beam (HEFIB) system technology, nanoprobe system design and specific ion beam writing applications will be presented. In particular, the combination of P-beam, heavy-ion writing and ion impl