Zobrazeno 1 - 10
of 82
pro vyhledávání: '"Daniel J. W. Brown"'
Autor:
Mathew Abraham, Rob Rafac, Georgiy O. Vaschenko, Andrew LaForge, Bruno La Fontaine, Daniel J. Riggs, Yezheng Tao, Matthew J. Graham, Ted Taylor, M. Vargas, Michael Kats, Slava Rokitski, Alexander Schafgans, Igor V. Fomenkov, Daniel J. W. Brown, Silvia De Dea, David C. Brandt, Michael Purvis, Alex I. Ershov, Steven Chang, Jayson Stewart
Publikováno v:
Advanced Optical Technologies. 6:173-186
Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requi
Autor:
Georgiy O. Vaschenko, Michael Purvis, Yezheng Tao, Robert J. Rafac, Slava Rokitski, Igor V. Fomenkov, Alexander Schafgans, David C. Brandt, Daniel J. W. Brown
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII.
In this paper, we provide an overview of various challenges and their solutions for scaling laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing. We will discuss improvements to source architect
Autor:
Michael Purvis, Alexander Schafgans, Rob Rafac, Alberto Pirati, Slava Rokitski, Igor V. Fomenkov, Mathew Abraham, Howard A. Scott, Aaron Fisher, Ted Taylor, Daniel J. W. Brown, Alice Koniges, M. Vargas, A. Link, Steven H. Langer, David C. Eder, Spencer Rich, Scott Wilks, Yezheng Tao, Josh Brown, David C. Brandt
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
We present highlights from plasma simulations performed in collaboration with Lawrence Livermore National Labs. This modeling is performed to advance the rate of learning about optimal EUV generation for laser produced plasmas and to provide insights
Autor:
Nigel R. Farrar, Daniel J. W. Brown
Publikováno v:
Laser Technik Journal. 6:40-43
Moore's Law, which predicts thecontinued increase in device density onintegrated circuits, has been driven by advancesin lithography. Both resolutionand productivity of the exposure toolhave been enabled by the light sourcetechnology. The transition
Autor:
Daniel J. Riggs, Rick Sandstrom, Slava Rokitski, Igor V. Fomenkov, Yezheng Tao, Rob Rafac, Christian Wagner, Norbert R. Bowering, Wayne J. Dunstan, Georgiy O. Vaschenko, Noreen Harned, Ron Kool, Hans Meiling, Alexander Schafgans, Alberto Pirati, Matthew J. Graham, Nigel R. Farrar, Daniel J. W. Brown, David C. Brandt, Michael Purvis, Alex I. Ershov
Publikováno v:
SPIE Proceedings.
This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the
Autor:
Christian Wagner, Jo Finders, Milos Popadic, Sjoerd Lok, Koen de Peuter, Arthur Winfried Eduardus Minnaert, Rudy Peeters, Nigel R. Farrar, Chris de Ruijter, Roderik van Es, Alexander Schafgans, Daniel J. W. Brown, Ron Kool, Noreen Harned, Herman Boom, Eelco van Setten, Jörg Mallmann, Martin Lin, Martijn van Noordenburg, Daniel Smith, Frank Y. S. Chuang, Alberto Pirati, Roger Huang, Marcel Beckers, Judon Stoeldraijer, David C. Brandt, Carmen Zoldesi, Hans Meiling
Publikováno v:
SPIE Proceedings.
Multiple NXE:3300 are operational at customer sites. These systems, equipped with a Numerical Aperture (NA) of 0.33, are being used by semiconductor manufacturers to support device development. Full Wafer Critical Dimension Uniformity (CDU) of 1.0 nm
Autor:
Daniel J. W. Brown, Michael J. Withford, James A. Piper, Graham D. Marshall, Robert Carman, Richard P. Mildren
Publikováno v:
Progress in Quantum Electronics. 28:165-196
Since their invention in 1966 copper vapour lasers (CVLs) have developed into a mature technology with applications including high-speed imaging, micro-machining, non-linear frequency conversion to the ultraviolet, and pumping of solid-state laser ma
Autor:
Nigel R. Farrar, David C. Brandt, Rudy Peeters, David W. Myers, Daniel J. W. Brown, Robert J. Rafac, Norbert R. Bowering, Robert Kazinczi, Daniel Smith, Noreen Harned, Silvia De Dea, Daniel J. Riggs, Bruno La Fontaine, Igor V. Fomenkov, Michael Purvis, Alex I. Ershov, Hans Meiling, Alberto Pirati
Publikováno v:
SPIE Proceedings.
This paper describes the development of a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193nm immersion double patterning techno
Autor:
Rudy Peeters, Silvia De Dea, David C. Brandt, Robert J. Rafac, Daniel J. W. Brown, Daniel J. Riggs, Norbert R. Bowering, Alex I. Ershov, Hans Meiling, Robert Kazinczi, Alberto Pirati, David W. Myers, Noreen Harned, Daniel Smith, Igor V. Fomenkov, Bruno La Fontaine, Nigel R. Farrar
Publikováno v:
SPIE Proceedings.
Laser produced plasma (LPP) light sources have been developed as the primary approach for EUV scanner imaging of circuit features in sub-20nm devices in high volume manufacturing (HVM). This paper provides a review of development progress and readine
Publikováno v:
IEEE Journal of Quantum Electronics. 37:518-524
We report the performance characteristics of a copper laser master-oscillator power-amplifier system incorporating kinetically enhanced active elements. The advantages provided by kinetic enhancement lead to record brightness levels.