Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Daniel J. Vitkavage"'
Autor:
Julia Svirchevski, Karen A. Reinhardt, Guang Ying Zhang, Marie Mitchel, David G. Hansen, Daniel J. Vitkavage, Daniel A. Koos, Frank Huang
Publikováno v:
Solid State Phenomena. :291-296
Introduction Cleaning is required following CMP (chemical mechanical planarization) to remove particles as well as metallic and organic contamination. Particle and contamination requirements tighten with each successive technology generation, and the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbe4b89d7f40926c5404579ffc26d0a2
https://doi.org/10.4028/www.scientific.net/ssp.103-104.291
https://doi.org/10.4028/www.scientific.net/ssp.103-104.291
Autor:
Daniel A. Koos, Julia Svirchevski, Daniel J. Vitkavage, David G. Hansen, Karen A. Reinhardt, Frank Huang, Marie Mitchel, Guang Ying Zhang
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0378c33a262b84120e16f770289e24c9
https://doi.org/10.4028/3-908451-06-x.291
https://doi.org/10.4028/3-908451-06-x.291
