Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Daniel J. Golich"'
Autor:
David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Bruno M. La Fontaine, Michael J. Lercel, Alexander N. Bykanov, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir B. Fleurov, Kevin Zhang, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Wayne J. Dunstan, Christian J. Wittak, Peter Baumgart, Toshihiko Ishihara, Rod D. Simmons, Robert N. Jacques, Robert A. Bergstedt
Publikováno v:
SPIE Proceedings.
Autor:
Oleh V. Khodykin, Alex I. Ershov, David W. Myers, Richard R. Hou, Alexander N. Bykanov, Daniel J. Golich, Shailendra N. Srivastava, Silvia De Dea, Imtiaz Ahmad, Richard L. Sandstrom, Georgiy O. Vaschenko, Igor V. Fomenkov, Wayne J. Dunstan, Kevin M. O'brien, Chirag Rajyaguru, Norbert R. Bowering, William N. Partlo, David C. Brandt
Publikováno v:
SPIE Proceedings.
This paper is devoted to the development of laser produced plasma (LPP) EUV source architecture for advanced lithography applications in high volume manufacturing of integrated circuits. The paper describes the development status of subsystems most c
Autor:
David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Alexander N. Bykanov, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Kevin M. O'Brien, Wayne J. Dunstan
Publikováno v:
SPIE Proceedings.
Autor:
Igor V. Fomenkov, David C. Brandt, Alexander N. Bykanov, Alex I. Ershov, William N. Partlo, Dave W. Myers, Norbert R. Böwering, Nigel R. Farrar, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffman, Christopher P. Chrobak, Shailendra N. Srivastava, Daniel J. Golich, David A. Vidusek, Silvia De Dea, Richard R. Hou
Publikováno v:
Alternative Lithographic Technologies.
Autor:
Christopher P. Chrobak, Silvia De Dea, Igor V. Fomenkov, Jerzy R. Hoffman, Georgiy O. Vaschenko, Richard R. Hou, Norbert R. Bowering, William N. Partlo, Oleh V. Khodykin, Daniel J. Golich, David A. Vidusek, David W. Myers, David C. Brandt, Shailendra N. Srivastava, Chirag Rajyaguru, Imtiaz Ahmad, Alexander N. Bykanov, Alex I. Ershov, Nigel R. Farrar
Publikováno v:
Alternative Lithographic Technologies.
Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at sub-32nm and beyond nodes on the ITRS roadmap. This paper provides a review of development progre
Publikováno v:
Journal of Applied Physics. 67:1203-1209
Autor:
Yezheng Tao, Michael J. Lercel, Norbert R. Bowering, Shailendra N. Srivastava, Alex I. Ershov, David W. Myers, Bruno La Fontaine, Daniel J. W. Brown, Daniel J. Golich, Silvia De Dea, Imtiaz Ahmad, Georgiy O. Vaschenko, Peter Baumgart, Alexander N. Bykanov, Igor V. Fomenkov, Chirag Rajyaguru, David C. Brandt, Nigel R. Farrar
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 11:021110-1
Laser-produced plasma sources offer the best option for scal- ability to support high-throughput lithography. Challenges associated with the complexity of such a source are being addressed in a pilot program where sources have been built and integrat
Autor:
Michael M. Malley, Daniel J. Golich
Publikováno v:
SPIE Proceedings.
We report the use of a windowless resonant spectrophone to make highly sensitive (10-9 cm-1) photoacoustic measurements of atmospheric water vapor and aerosol absorption. A tunable high-resolution cw Nd:YAG laser was used to measure the water vapor l
Autor:
David A. Vidusek, David C. Brandt, Christopher P. Chrobak, Shailendra N. Srivastava, Silvia De Dea, William N. Partlo, Dave Myers, Georgiy O. Vaschenko, Imtiaz Ahmad, Nigel R. Farrar, Chirag Rajyaguru, Oleh V. Khodykin, Richard R. Hou, Igor V. Fomenkov, Alexander N. Bykanov, Alexander I. Ershov, Jerzy R. Hoffman, Norbert R. Bowering, Daniel J. Golich
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 8:041504
Improved performance and specific results are reported for several test and prototype extreme ultraviolet EUV light sources devel- oped for next-generation lithography. High repetition rate and high-power CO2 laser-produced plasma sources operating o
Publikováno v:
Journal of Applied Physics. 64:521-527
We measured the triplet extinction coefficients eT over the laser action spectral region of DODC, DMC, Sulforhodamine B, Rhodamine 575, Coumarin 523, Coumarin 521, Coumarin 504, Coumarin 498, Coumarin 490, LD466, bis‐MSB, and BBO. We employed the d